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Kim, Jin Woong, Osumi, Tsuyoshi, Mastuoka, Masashi, Tai, Takeshi, Nishide, Masamichi, Funakubo, Hiroshi, Shima, Hiromi, Nishida, Ken, Yamamoto, Takashi (2012) Preparation and Characterization of Ba(ZrxTi1-x)O3Thin Films Using Reactive Sputtering Method. Japanese Journal of Applied Physics, 51 (9) 9 doi:10.7567/jjap.51.09la01

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Reference TypeJournal (article/letter/editorial)
TitlePreparation and Characterization of Ba(ZrxTi1-x)O3Thin Films Using Reactive Sputtering Method
JournalJapanese Journal of Applied Physics
AuthorsKim, Jin WoongAuthor
Osumi, TsuyoshiAuthor
Mastuoka, MasashiAuthor
Tai, TakeshiAuthor
Nishide, MasamichiAuthor
Funakubo, HiroshiAuthor
Shima, HiromiAuthor
Nishida, KenAuthor
Yamamoto, TakashiAuthor
Year2012 (September 1)Volume51
Issue9
PublisherJapan Society of Applied Physics
DOIdoi:10.7567/jjap.51.09la01Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID15043275Long-form Identifiermindat:1:5:15043275:5
GUID0
Full ReferenceKim, Jin Woong, Osumi, Tsuyoshi, Mastuoka, Masashi, Tai, Takeshi, Nishide, Masamichi, Funakubo, Hiroshi, Shima, Hiromi, Nishida, Ken, Yamamoto, Takashi (2012) Preparation and Characterization of Ba(ZrxTi1-x)O3Thin Films Using Reactive Sputtering Method. Japanese Journal of Applied Physics, 51 (9) 9 doi:10.7567/jjap.51.09la01
Plain TextKim, Jin Woong, Osumi, Tsuyoshi, Mastuoka, Masashi, Tai, Takeshi, Nishide, Masamichi, Funakubo, Hiroshi, Shima, Hiromi, Nishida, Ken, Yamamoto, Takashi (2012) Preparation and Characterization of Ba(ZrxTi1-x)O3Thin Films Using Reactive Sputtering Method. Japanese Journal of Applied Physics, 51 (9) 9 doi:10.7567/jjap.51.09la01
In(2012, September) Japanese Journal of Applied Physics Vol. 51 (9) Japan Society of Applied Physics

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Kim, Jin Woong, Osumi, Tsuyoshi, Mastuoka, Masashi, Tai, Takeshi, Nishide, Masamichi, Funakubo, Hiroshi, Shima, Hiromi, Nishida, Ken, Yamamoto, Takashi (2012) Preparation and Characterization of Ba(Zr$_{x}$Ti$_{1-x}$)O$_{3}$ Thin Films Using Reactive Sputtering Method. Japanese Journal of Applied Physics, 51. 9 doi:10.1143/jjap.51.09la01
Woong, Kim Jin, Shima, Hiromi, Yamamoto, Takashi, Yasui, Shintaro, Funakubo, Hiroshi, Yamada, Tomoaki, Nishida, Ken (2014) Preparation and characterization of Ba(ZrxTi1−x)O3thin films for high-frequency applications. Japanese Journal of Applied Physics, 53 (9) 9 doi:10.7567/jjap.53.09pb04
Tai, Takeshi, Nishide, Masamichi, Matsuoka, Masashi, Kamo, Takafumi, Funakubo, Hiroshi, Katoda, Takashi, Shima, Hiromi, Nishida, Ken, Yamamoto, Takashi (2012) Investigation of Sputtering Damage in SrRuO3Films Prepared by Sputtering with Raman and X-ray Photoemission Spectroscopies. Japanese Journal of Applied Physics, 51 (9) 9 doi:10.7567/jjap.51.09la19
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Yoshiizumi, Kenji, Tai, Takeshi, Nishide, Masamichi, Shima, Hiromi, Funakubo, Hiroshi, Nishida, Ken, Yamamoto, Takashi (2015) Growth and evaluation of epitaxial BaTiO3thin films of less than 100 nm thickness by metal–organic chemical vapor deposition. Japanese Journal of Applied Physics, 54 (3) 35501 doi:10.7567/jjap.54.035501
Kim, Jin-Woong, Shima, Hiromi, Nishida, Ken, Yamamoto, Takashi, Funakubo, Hiroshi (2014) Structural and tunable characteristics of Ba(Zr x Ti1−x )O3 films prepared by RF-magnetron sputtering using a metal target. Journal of the Korean Physical Society, 65 (3). 275-280 doi:10.3938/jkps.65.275
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Jinwoong, Kim, Shima, Hiromi, Yamamoto, Takashi, Yasui, Shintaro, Funakubo, Hiroshi, Yamada, Tomoaki, Nishida, Ken (2015) Ba(Zr Ti1−)O3 thin films for tunable microwave applications. Ceramics International, 41. doi:10.1016/j.ceramint.2015.03.184
 
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