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Fei, Jiayang, Kita, Koji (2016) Understanding the impact of interface reaction on dipole strength at MgO/SiO2and Y2O3/SiO2interfaces. Japanese Journal of Applied Physics, 55 (4) 4 doi:10.7567/jjap.55.04eb11

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Reference TypeJournal (article/letter/editorial)
TitleUnderstanding the impact of interface reaction on dipole strength at MgO/SiO2and Y2O3/SiO2interfaces
JournalJapanese Journal of Applied Physics
AuthorsFei, JiayangAuthor
Kita, KojiAuthor
Year2016 (April 1)Volume55
Issue4
PublisherJapan Society of Applied Physics
DOIdoi:10.7567/jjap.55.04eb11Search in ResearchGate
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Mindat Ref. ID15046105Long-form Identifiermindat:1:5:15046105:2
GUID0
Full ReferenceFei, Jiayang, Kita, Koji (2016) Understanding the impact of interface reaction on dipole strength at MgO/SiO2and Y2O3/SiO2interfaces. Japanese Journal of Applied Physics, 55 (4) 4 doi:10.7567/jjap.55.04eb11
Plain TextFei, Jiayang, Kita, Koji (2016) Understanding the impact of interface reaction on dipole strength at MgO/SiO2and Y2O3/SiO2interfaces. Japanese Journal of Applied Physics, 55 (4) 4 doi:10.7567/jjap.55.04eb11
In(2016, April) Japanese Journal of Applied Physics Vol. 55 (4) Japan Society of Applied Physics

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Zhu, Li Qiang, Kita, Koji, Nishimura, Tomonori, Nagashio, Kosuke, Wang, Sheng Kai, Toriumi, Akira (2011) Interfacial Dipole at High-kDielectric/SiO2Interface: X-ray Photoelectron Spectroscopy Characteristics. Japanese Journal of Applied Physics, 50 (3) 31502 doi:10.7567/jjap.50.031502
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