Horikiri, Fumimasa, Narita, Yoshinobu, Yoshida, Takehiro, Kitamura, Toshio, Ohta, Hiroshi, Nakamura, Tohru, Mishima, Tomoyoshi (2017) Wafer-level nondestructive inspection of substrate off-angle and net donor concentration of the n−-drift layer in vertical GaN-on-GaN Schottky diodes. Japanese Journal of Applied Physics, 56 (6) 61001 doi:10.7567/jjap.56.061001
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Wafer-level nondestructive inspection of substrate off-angle and net donor concentration of the n−-drift layer in vertical GaN-on-GaN Schottky diodes | ||
Journal | Japanese Journal of Applied Physics | ||
Authors | Horikiri, Fumimasa | Author | |
Narita, Yoshinobu | Author | ||
Yoshida, Takehiro | Author | ||
Kitamura, Toshio | Author | ||
Ohta, Hiroshi | Author | ||
Nakamura, Tohru | Author | ||
Mishima, Tomoyoshi | Author | ||
Year | 2017 (June 1) | Volume | 56 |
Issue | 6 | ||
Publisher | Japan Society of Applied Physics | ||
DOI | doi:10.7567/jjap.56.061001Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 15047650 | Long-form Identifier | mindat:1:5:15047650:6 |
GUID | 0 | ||
Full Reference | Horikiri, Fumimasa, Narita, Yoshinobu, Yoshida, Takehiro, Kitamura, Toshio, Ohta, Hiroshi, Nakamura, Tohru, Mishima, Tomoyoshi (2017) Wafer-level nondestructive inspection of substrate off-angle and net donor concentration of the n−-drift layer in vertical GaN-on-GaN Schottky diodes. Japanese Journal of Applied Physics, 56 (6) 61001 doi:10.7567/jjap.56.061001 | ||
Plain Text | Horikiri, Fumimasa, Narita, Yoshinobu, Yoshida, Takehiro, Kitamura, Toshio, Ohta, Hiroshi, Nakamura, Tohru, Mishima, Tomoyoshi (2017) Wafer-level nondestructive inspection of substrate off-angle and net donor concentration of the n−-drift layer in vertical GaN-on-GaN Schottky diodes. Japanese Journal of Applied Physics, 56 (6) 61001 doi:10.7567/jjap.56.061001 | ||
In | (2017, June) Japanese Journal of Applied Physics Vol. 56 (6) Japan Society of Applied Physics |
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