Liu, Zecheng, Ishikawa, Kenji, Imamura, Masato, Tsutsumi, Takayoshi, Kondo, Hiroki, Oda, Osamu, Sekine, Makoto, Hori, Masaru (2018) Temperature dependence on plasma-induced damage and chemical reactions in GaN etching processes using chlorine plasma. Japanese Journal of Applied Physics, 57 (6) 6 doi:10.7567/jjap.57.06jd01
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Temperature dependence on plasma-induced damage and chemical reactions in GaN etching processes using chlorine plasma | ||
| Journal | Japanese Journal of Applied Physics | ||
| Authors | Liu, Zecheng | Author | |
| Ishikawa, Kenji | Author | ||
| Imamura, Masato | Author | ||
| Tsutsumi, Takayoshi | Author | ||
| Kondo, Hiroki | Author | ||
| Oda, Osamu | Author | ||
| Sekine, Makoto | Author | ||
| Hori, Masaru | Author | ||
| Year | 2018 (June 1) | Volume | 57 |
| Issue | 6 | ||
| Publisher | Japan Society of Applied Physics | ||
| DOI | doi:10.7567/jjap.57.06jd01Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 15049098 | Long-form Identifier | mindat:1:5:15049098:4 |
| GUID | 0 | ||
| Full Reference | Liu, Zecheng, Ishikawa, Kenji, Imamura, Masato, Tsutsumi, Takayoshi, Kondo, Hiroki, Oda, Osamu, Sekine, Makoto, Hori, Masaru (2018) Temperature dependence on plasma-induced damage and chemical reactions in GaN etching processes using chlorine plasma. Japanese Journal of Applied Physics, 57 (6) 6 doi:10.7567/jjap.57.06jd01 | ||
| Plain Text | Liu, Zecheng, Ishikawa, Kenji, Imamura, Masato, Tsutsumi, Takayoshi, Kondo, Hiroki, Oda, Osamu, Sekine, Makoto, Hori, Masaru (2018) Temperature dependence on plasma-induced damage and chemical reactions in GaN etching processes using chlorine plasma. Japanese Journal of Applied Physics, 57 (6) 6 doi:10.7567/jjap.57.06jd01 | ||
| In | (2018, June) Japanese Journal of Applied Physics Vol. 57 (6) Japan Society of Applied Physics | ||
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