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Xie, Bo-Wei, Ding, Fa-Zhu, Shang, Hong-Jing, Huang, Da-Xing, Li, Tai-Guang, Zou, Qi, Zhang, Ji-Liang, Gu, Hong-Wei (2021) Substrate angle-induced fully c-axis orientation of AlN films deposited by off-normal DC sputtering method. Rare Metals, 40 (12) 3668-3675 doi:10.1007/s12598-020-01675-z

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Reference TypeJournal (article/letter/editorial)
TitleSubstrate angle-induced fully c-axis orientation of AlN films deposited by off-normal DC sputtering method
JournalRare Metals
AuthorsXie, Bo-WeiAuthor
Ding, Fa-ZhuAuthor
Shang, Hong-JingAuthor
Huang, Da-XingAuthor
Li, Tai-GuangAuthor
Zou, QiAuthor
Zhang, Ji-LiangAuthor
Gu, Hong-WeiAuthor
Year2021 (December)Volume40
Issue12
PublisherSpringer Science and Business Media LLC
DOIdoi:10.1007/s12598-020-01675-zSearch in ResearchGate
Generate Citation Formats
Mindat Ref. ID15206053Long-form Identifiermindat:1:5:15206053:6
GUID0
Full ReferenceXie, Bo-Wei, Ding, Fa-Zhu, Shang, Hong-Jing, Huang, Da-Xing, Li, Tai-Guang, Zou, Qi, Zhang, Ji-Liang, Gu, Hong-Wei (2021) Substrate angle-induced fully c-axis orientation of AlN films deposited by off-normal DC sputtering method. Rare Metals, 40 (12) 3668-3675 doi:10.1007/s12598-020-01675-z
Plain TextXie, Bo-Wei, Ding, Fa-Zhu, Shang, Hong-Jing, Huang, Da-Xing, Li, Tai-Guang, Zou, Qi, Zhang, Ji-Liang, Gu, Hong-Wei (2021) Substrate angle-induced fully c-axis orientation of AlN films deposited by off-normal DC sputtering method. Rare Metals, 40 (12) 3668-3675 doi:10.1007/s12598-020-01675-z
In(2021, December) Rare Metals Vol. 40 (12) Springer Science and Business Media LLC

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