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Hoffman, E. W., Macek, R. J., van Dyck, O., Lee, D., Harvey, A., Bridge, J., Caine, J. (1979) High Intensity Beam Profile Monitors for the LAMPF Primary Beam Lines. IEEE Transactions on Nuclear Science, 26 (3) 3420-3422 doi:10.1109/tns.1979.4330056

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Reference TypeJournal (article/letter/editorial)
TitleHigh Intensity Beam Profile Monitors for the LAMPF Primary Beam Lines
JournalIEEE Transactions on Nuclear Science
AuthorsHoffman, E. W.Author
Macek, R. J.Author
van Dyck, O.Author
Lee, D.Author
Harvey, A.Author
Bridge, J.Author
Caine, J.Author
Year1979 (June)Volume26
Issue3
PublisherInstitute of Electrical and Electronics Engineers (IEEE)
DOIdoi:10.1109/tns.1979.4330056Search in ResearchGate
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Mindat Ref. ID15565711Long-form Identifiermindat:1:5:15565711:5
GUID0
Full ReferenceHoffman, E. W., Macek, R. J., van Dyck, O., Lee, D., Harvey, A., Bridge, J., Caine, J. (1979) High Intensity Beam Profile Monitors for the LAMPF Primary Beam Lines. IEEE Transactions on Nuclear Science, 26 (3) 3420-3422 doi:10.1109/tns.1979.4330056
Plain TextHoffman, E. W., Macek, R. J., van Dyck, O., Lee, D., Harvey, A., Bridge, J., Caine, J. (1979) High Intensity Beam Profile Monitors for the LAMPF Primary Beam Lines. IEEE Transactions on Nuclear Science, 26 (3) 3420-3422 doi:10.1109/tns.1979.4330056
In(1979, June) IEEE Transactions on Nuclear Science Vol. 26 (3) Institute of Electrical and Electronics Engineers (IEEE)


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