Reference Type | Journal (article/letter/editorial) |
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Title | MeV Ion Implantation Systems for Production Processing of Silicon Wafers |
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Journal | IEEE Transactions on Nuclear Science |
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Authors | Norton, G. A. | Author |
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Klody, G. M. | Author |
Year | 1983 | Volume | 30 |
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Issue | 2 |
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Publisher | Institute of Electrical and Electronics Engineers (IEEE) |
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DOI | doi:10.1109/tns.1983.4332619Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 15568497 | Long-form Identifier | mindat:1:5:15568497:5 |
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GUID | 0 |
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Full Reference | Norton, G. A., Klody, G. M. (1983) MeV Ion Implantation Systems for Production Processing of Silicon Wafers. IEEE Transactions on Nuclear Science, 30 (2) 1701-1704 doi:10.1109/tns.1983.4332619 |
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Plain Text | Norton, G. A., Klody, G. M. (1983) MeV Ion Implantation Systems for Production Processing of Silicon Wafers. IEEE Transactions on Nuclear Science, 30 (2) 1701-1704 doi:10.1109/tns.1983.4332619 |
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In | (1983) IEEE Transactions on Nuclear Science Vol. 30 (2) Institute of Electrical and Electronics Engineers (IEEE) |
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