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Shen, Juanfen, Chen, Haibo, Chen, Jiapeng, Lin, Lin, Gu, Yunyun, Jiang, Zhenlin, Li, Jun, Sun, Tao (2023) Mechanistic difference between Si-face and C-face polishing of 4H–SiC substrates in aqueous and non-aqueous slurries. Ceramics International, 49 (5) 7274-7283 doi:10.1016/j.ceramint.2022.10.193

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Reference TypeJournal (article/letter/editorial)
TitleMechanistic difference between Si-face and C-face polishing of 4H–SiC substrates in aqueous and non-aqueous slurries
JournalCeramics International
AuthorsShen, JuanfenAuthor
Chen, HaiboAuthor
Chen, JiapengAuthor
Lin, LinAuthor
Gu, YunyunAuthor
Jiang, ZhenlinAuthor
Li, JunAuthor
Sun, TaoAuthor
Year2023 (March)Volume49
Issue5
PublisherElsevier BV
DOIdoi:10.1016/j.ceramint.2022.10.193Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID15692745Long-form Identifiermindat:1:5:15692745:3
GUID0
Full ReferenceShen, Juanfen, Chen, Haibo, Chen, Jiapeng, Lin, Lin, Gu, Yunyun, Jiang, Zhenlin, Li, Jun, Sun, Tao (2023) Mechanistic difference between Si-face and C-face polishing of 4H–SiC substrates in aqueous and non-aqueous slurries. Ceramics International, 49 (5) 7274-7283 doi:10.1016/j.ceramint.2022.10.193
Plain TextShen, Juanfen, Chen, Haibo, Chen, Jiapeng, Lin, Lin, Gu, Yunyun, Jiang, Zhenlin, Li, Jun, Sun, Tao (2023) Mechanistic difference between Si-face and C-face polishing of 4H–SiC substrates in aqueous and non-aqueous slurries. Ceramics International, 49 (5) 7274-7283 doi:10.1016/j.ceramint.2022.10.193
In(2023, March) Ceramics International Vol. 49 (5) Elsevier BV

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