Sattari-Esfahlan, Seyed Mehdi, Kim, Hyoung Gyun, Hyun, Sang Hwa, Choi, Jun-Hui, Hwang, Hyun Sik, Kim, Eui-Tae, Park, Hyeong Gi, Lee, Jae-Hyun (2023) Low-Temperature Direct Growth of Amorphous Boron Nitride Films for High-Performance Nanoelectronic Device Applications. ACS Applied Materials & Interfaces, 15 (5) 7274-7281 doi:10.1021/acsami.2c18706
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Low-Temperature Direct Growth of Amorphous Boron Nitride Films for High-Performance Nanoelectronic Device Applications | ||
Journal | ACS Applied Materials & Interfaces | ||
Authors | Sattari-Esfahlan, Seyed Mehdi | Author | |
Kim, Hyoung Gyun | Author | ||
Hyun, Sang Hwa | Author | ||
Choi, Jun-Hui | Author | ||
Hwang, Hyun Sik | Author | ||
Kim, Eui-Tae | Author | ||
Park, Hyeong Gi | Author | ||
Lee, Jae-Hyun | Author | ||
Year | 2023 (February 8) | Volume | 15 |
Issue | 5 | ||
Publisher | American Chemical Society (ACS) | ||
DOI | doi:10.1021/acsami.2c18706Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 15694883 | Long-form Identifier | mindat:1:5:15694883:0 |
GUID | 0 | ||
Full Reference | Sattari-Esfahlan, Seyed Mehdi, Kim, Hyoung Gyun, Hyun, Sang Hwa, Choi, Jun-Hui, Hwang, Hyun Sik, Kim, Eui-Tae, Park, Hyeong Gi, Lee, Jae-Hyun (2023) Low-Temperature Direct Growth of Amorphous Boron Nitride Films for High-Performance Nanoelectronic Device Applications. ACS Applied Materials & Interfaces, 15 (5) 7274-7281 doi:10.1021/acsami.2c18706 | ||
Plain Text | Sattari-Esfahlan, Seyed Mehdi, Kim, Hyoung Gyun, Hyun, Sang Hwa, Choi, Jun-Hui, Hwang, Hyun Sik, Kim, Eui-Tae, Park, Hyeong Gi, Lee, Jae-Hyun (2023) Low-Temperature Direct Growth of Amorphous Boron Nitride Films for High-Performance Nanoelectronic Device Applications. ACS Applied Materials & Interfaces, 15 (5) 7274-7281 doi:10.1021/acsami.2c18706 | ||
In | (2023, February) ACS Applied Materials & Interfaces Vol. 15 (5) American Chemical Society (ACS) |
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