Ma, Huizhong, Chen, Yunlong, Li, Na, Tan, Cong, Rong, Yan, Chen, Hongye, Jia, Jia, Zhang, Lan (2023) Process optimization and effect of sputtering pressure on electrochromic properties of flexible WO3 films prepared by DC magnetron sputtering. Physica B: Condensed Matter, 654. 414728 doi:10.1016/j.physb.2023.414728
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Process optimization and effect of sputtering pressure on electrochromic properties of flexible WO3 films prepared by DC magnetron sputtering | ||
| Journal | Physica B: Condensed Matter | ||
| Authors | Ma, Huizhong | Author | |
| Chen, Yunlong | Author | ||
| Li, Na | Author | ||
| Tan, Cong | Author | ||
| Rong, Yan | Author | ||
| Chen, Hongye | Author | ||
| Jia, Jia | Author | ||
| Zhang, Lan | Author | ||
| Year | 2023 (April) | Volume | 654 |
| Publisher | Elsevier BV | ||
| DOI | doi:10.1016/j.physb.2023.414728Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 15696063 | Long-form Identifier | mindat:1:5:15696063:4 |
| GUID | 0 | ||
| Full Reference | Ma, Huizhong, Chen, Yunlong, Li, Na, Tan, Cong, Rong, Yan, Chen, Hongye, Jia, Jia, Zhang, Lan (2023) Process optimization and effect of sputtering pressure on electrochromic properties of flexible WO3 films prepared by DC magnetron sputtering. Physica B: Condensed Matter, 654. 414728 doi:10.1016/j.physb.2023.414728 | ||
| Plain Text | Ma, Huizhong, Chen, Yunlong, Li, Na, Tan, Cong, Rong, Yan, Chen, Hongye, Jia, Jia, Zhang, Lan (2023) Process optimization and effect of sputtering pressure on electrochromic properties of flexible WO3 films prepared by DC magnetron sputtering. Physica B: Condensed Matter, 654. 414728 doi:10.1016/j.physb.2023.414728 | ||
| In | (2023) Physica B: Condensed Matter Vol. 654. Elsevier BV | ||
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