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Tsai, Du-Cheng, Chen, Erh-Chiang, Huang, Yen-Lin, Chang, Zue-Chin, Shieu, Fuh-Sheng (2023) Structure and characteristic studies of ZrAlNiCu films prepared by magnetron sputtering. Materials Science and Technology, 39 (10) 1278-1287 doi:10.1080/02670836.2022.2164400

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Reference TypeJournal (article/letter/editorial)
TitleStructure and characteristic studies of ZrAlNiCu films prepared by magnetron sputtering
JournalMaterials Science and Technology
AuthorsTsai, Du-ChengAuthor
Chen, Erh-ChiangAuthor
Huang, Yen-LinAuthor
Chang, Zue-ChinAuthor
Shieu, Fuh-ShengAuthor
Year2023 (July 3)Volume39
Issue10
PublisherInforma UK Limited
DOIdoi:10.1080/02670836.2022.2164400Search in ResearchGate
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Mindat Ref. ID15836712Long-form Identifiermindat:1:5:15836712:7
GUID0
Full ReferenceTsai, Du-Cheng, Chen, Erh-Chiang, Huang, Yen-Lin, Chang, Zue-Chin, Shieu, Fuh-Sheng (2023) Structure and characteristic studies of ZrAlNiCu films prepared by magnetron sputtering. Materials Science and Technology, 39 (10) 1278-1287 doi:10.1080/02670836.2022.2164400
Plain TextTsai, Du-Cheng, Chen, Erh-Chiang, Huang, Yen-Lin, Chang, Zue-Chin, Shieu, Fuh-Sheng (2023) Structure and characteristic studies of ZrAlNiCu films prepared by magnetron sputtering. Materials Science and Technology, 39 (10) 1278-1287 doi:10.1080/02670836.2022.2164400
In(2023, July) Materials Science and Technology Vol. 39 (10) Informa UK Limited

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