Vijh, Ashok K. (1985) The fundamental factor determining the sputtering yields of metals bombarded with 20-keV oxygen cations. Journal of Materials Science Letters, 4 (8) 1036-1037 doi:10.1007/bf00721113
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | The fundamental factor determining the sputtering yields of metals bombarded with 20-keV oxygen cations | ||
Journal | Journal of Materials Science Letters | ||
Authors | Vijh, Ashok K. | Author | |
Year | 1985 (August) | Volume | 4 |
Issue | 8 | ||
Publisher | Springer Science and Business Media LLC | ||
DOI | doi:10.1007/bf00721113Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 16409425 | Long-form Identifier | mindat:1:5:16409425:3 |
GUID | 0 | ||
Full Reference | Vijh, Ashok K. (1985) The fundamental factor determining the sputtering yields of metals bombarded with 20-keV oxygen cations. Journal of Materials Science Letters, 4 (8) 1036-1037 doi:10.1007/bf00721113 | ||
Plain Text | Vijh, Ashok K. (1985) The fundamental factor determining the sputtering yields of metals bombarded with 20-keV oxygen cations. Journal of Materials Science Letters, 4 (8) 1036-1037 doi:10.1007/bf00721113 | ||
In | (1985, August) Journal of Materials Science Letters Vol. 4 (8) Springer Science and Business Media LLC |
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