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Dhanasekaran, P. Caleb, Gopalam, B. S. V. (1987) Influence of minority carrier diffusion length in determining the effects of base layer thickness of an n+p silicon solar cell and a BSF cell by numerical analysis. Journal of Materials Science Letters, 6 (10) 1156-1160 doi:10.1007/bf01729168

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Reference TypeJournal (article/letter/editorial)
TitleInfluence of minority carrier diffusion length in determining the effects of base layer thickness of an n+p silicon solar cell and a BSF cell by numerical analysis
JournalJournal of Materials Science Letters
AuthorsDhanasekaran, P. CalebAuthor
Gopalam, B. S. V.Author
Year1987 (October)Volume6
Issue10
PublisherSpringer Science and Business Media LLC
DOIdoi:10.1007/bf01729168Search in ResearchGate
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Mindat Ref. ID16410068Long-form Identifiermindat:1:5:16410068:8
GUID0
Full ReferenceDhanasekaran, P. Caleb, Gopalam, B. S. V. (1987) Influence of minority carrier diffusion length in determining the effects of base layer thickness of an n+p silicon solar cell and a BSF cell by numerical analysis. Journal of Materials Science Letters, 6 (10) 1156-1160 doi:10.1007/bf01729168
Plain TextDhanasekaran, P. Caleb, Gopalam, B. S. V. (1987) Influence of minority carrier diffusion length in determining the effects of base layer thickness of an n+p silicon solar cell and a BSF cell by numerical analysis. Journal of Materials Science Letters, 6 (10) 1156-1160 doi:10.1007/bf01729168
In(1987, October) Journal of Materials Science Letters Vol. 6 (10) Springer Science and Business Media LLC


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