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Bohórquez Martínez, Carolina, Vazquez Arce, Jorge Luis, Cuentas Gallegos, Ana Karina, Tiznado, Hugo (2025) Enhanced oxygen sensing in ZrO2 thin films via atomic layer deposition by post-deposition annealing. Ceramics International, 51 (7). doi:10.1016/j.ceramint.2024.12.380

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Reference TypeJournal (article/letter/editorial)
TitleEnhanced oxygen sensing in ZrO2 thin films via atomic layer deposition by post-deposition annealing
JournalCeramics International
AuthorsBohórquez Martínez, CarolinaAuthor
Vazquez Arce, Jorge LuisAuthor
Cuentas Gallegos, Ana KarinaAuthor
Tiznado, HugoAuthor
Year2025 (March)Volume51
Issue7
PublisherElsevier BV
DOIdoi:10.1016/j.ceramint.2024.12.380Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID18241508Long-form Identifiermindat:1:5:18241508:5
GUID0
Full ReferenceBohórquez Martínez, Carolina, Vazquez Arce, Jorge Luis, Cuentas Gallegos, Ana Karina, Tiznado, Hugo (2025) Enhanced oxygen sensing in ZrO2 thin films via atomic layer deposition by post-deposition annealing. Ceramics International, 51 (7). doi:10.1016/j.ceramint.2024.12.380
Plain TextBohórquez Martínez, Carolina, Vazquez Arce, Jorge Luis, Cuentas Gallegos, Ana Karina, Tiznado, Hugo (2025) Enhanced oxygen sensing in ZrO2 thin films via atomic layer deposition by post-deposition annealing. Ceramics International, 51 (7). doi:10.1016/j.ceramint.2024.12.380
In(2025, March) Ceramics International Vol. 51 (7). Elsevier BV

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See Also

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Vazquez, Jorge Luis, López, Javier, Bohórquez, Carolina, Lizarraga, Eder, Blanco, Eduardo, Can-Uc, Bonifacio, Romo, Oscar, Nedev, Nicola, Farías, Mario H., Tiznado, Hugo (2023) O3-Annealing Effect on the Etching Resilience of a TiO2/Al2O3 filter Prepared by Atomic Layer Deposition. ACS Applied Materials & Interfaces, 15 (34) 40942-40953 doi:10.1021/acsami.3c07586
Ahn, Ji Sang, Kang, Wangu, Han, Jeong Hwan (2025) Low-resistivity and high-density molybdenum carbonitride films grown by plasma-enhanced atomic layer deposition. Ceramics International, 51 (9). doi:10.1016/j.ceramint.2025.01.065
Ambartsumov, M.G.; Tarala, V.A.; Medyanik, E.V.; Kovalenko, V.V.; Chapura, O.M. (2025) Post-annealing microstructural evolution of titanium dioxide thin films grown by thermal and plasma-enhanced atomic layer deposition. Applied Surface Science, 714. doi:10.1016/j.apsusc.2025.164419
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Yang, Haram; Kim, Hyeongjun; Jo, Seungmin; Lee, Woongkyu (2025) Atomic layer etching of ZrO2 thin films for DRAM capacitors using NF3 plasma and TiCl4. Ceramics International, 51 (15). doi:10.1016/j.ceramint.2025.04.329
Cheng, Yung-Chen (2011) Effects of post-deposition rapid thermal annealing on aluminum-doped ZnO thin films grown by atomic layer deposition. Applied Surface Science, 258. 604-607 doi:10.1016/j.apsusc.2011.07.124
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Chen, Wen, Ren, Wei, Zhang, Yijun, Liu, Ming, Ye, Zuo-Guang (2015) Preparation and properties of ZrO2 and TiO2 films and their nanolaminates by atomic layer deposition. Ceramics International, 41. doi:10.1016/j.ceramint.2015.03.257
Lee, Seung-Hwan, Kwon, Jung-Dae, Ahn, Ji-Hoon, Park, Jin-Seong (2017) Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition. Ceramics International, 43. 6580-6584 doi:10.1016/j.ceramint.2017.02.089
 
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