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Xia, Yang; Wang, Dan (2025) Effect of Sputtering Process Parameters on Physical Properties and Electron Emission Level of Titanium Nitride Films. Inorganics, 13 (6). doi:10.3390/inorganics13060201

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Reference TypeJournal (article/letter/editorial)
TitleEffect of Sputtering Process Parameters on Physical Properties and Electron Emission Level of Titanium Nitride Films
JournalInorganics
AuthorsXia, YangAuthor
Wang, DanAuthor
Year2025 (June 16)Volume13
Issue6
PublisherMDPI AG
DOIdoi:10.3390/inorganics13060201Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID18587588Long-form Identifiermindat:1:5:18587588:6
GUID0
Full ReferenceXia, Yang; Wang, Dan (2025) Effect of Sputtering Process Parameters on Physical Properties and Electron Emission Level of Titanium Nitride Films. Inorganics, 13 (6). doi:10.3390/inorganics13060201
Plain TextXia, Yang; Wang, Dan (2025) Effect of Sputtering Process Parameters on Physical Properties and Electron Emission Level of Titanium Nitride Films. Inorganics, 13 (6). doi:10.3390/inorganics13060201
In(2025, May) Inorganics Vol. 13 (6). MDPI AG

References Listed

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See Also

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Su, Yali; Wang, Quantai; Wang, Tiantian (2025) Effect of Composition on Electrical Resistivity and Secondary Electron Emission Regularities of Tantalum Nitride Films Fabricated by Sputtering with Various Nitrogen Gas Flow Ratios. Inorganics, 13 (9). doi:10.3390/inorganics13090289
Gu, Yuqing, Li, Juannan, Wang, Dan (2025) Investigation on the Electron Emission Regularity of Sputtered Boron Nitride Thin Films and Microstructured Array Surfaces. Inorganics, 13 (4). doi:10.3390/inorganics13040102
Wang, Luyi, Cheng, Jinhong, Qu, Ke, Zhu, Qingfeng, Tian, Bobo, Yang, Zhenzhong (2025) Aluminum-Nitride-Based Semiconductors: Growth Processes, Ferroelectric Properties, and Performance Enhancements. Inorganics, 13 (2). doi:10.3390/inorganics13020029
Ding, Yaoxin; Leng, Jiahao; Zhang, Mingyang; Shen, Jie (2025) Photoelectrochemical and Photocatalytic Properties of SnS/TiO2 Heterostructure Thin Films Prepared by Magnetron Sputtering Method. Inorganics, 13 (7). doi:10.3390/inorganics13070208
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Wang, Yunrong, Xia, Zhangcong, Wu, Shengli, Li, Jie (2024) Effects of sputtering pressure on microstructure and secondary electron emission properties of AlN film prepared by magnetron sputtering. Materials Letters, 377. doi:10.1016/j.matlet.2024.137319
Zhang, Shidong, Yan, Fuyao, Yang, Yang, Yan, Mufu, Zhang, Yanxiang, Guo, Jinhao, Li, Hongtao (2019) Effects of sputtering gas on microstructure and tribological properties of titanium nitride films. Applied Surface Science, 488. 61-69 doi:10.1016/j.apsusc.2019.05.148
Kong, Jing, Huang, Shiqi, Guo, Xingang, Chen, Dexin, Shen, Gengzhe, Chen, Zhengjian, Qian, Jin, Liang, Yining, Kang, Zhixin, Lo, Kin-Ho, et al. (2025) Effect of target current on microstructure, color and properties of titanium nitride/titanium carbonitride films via mid-frequency magnetron sputtering. Materials Chemistry and Physics, 333. doi:10.1016/j.matchemphys.2025.130375
Li, Xia; Li, Yang; Zhang, Gangqiang; So, Yat-Ming; Pan, Yu (2025) Recent Advances in Zinc Complexes for Stereoselective Ring-Opening Polymerization and Copolymerization. Inorganics, 13 (6). doi:10.3390/inorganics13060185
Kuzin, Evgenii (2025) Synthesis and Use of Complex Titanium-Containing Coagulant in Water Purification Processes. Inorganics, 13 (1). doi:10.3390/inorganics13010009
Buiting, M. J. (1992) Relationship Between the Process Parameters and Film Properties of “Low Temperature” Low Pressure Chemical Vapor Deposition Titanium Nitride Films. Journal of the Electrochemical Society, 139. 2580pp. doi:10.1149/1.2221267
 
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