Reference Type | Journal (article/letter/editorial) |
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Title | Si2, SiH3, and HSiO molecules: ESR at 4 K |
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Journal | The Journal of Chemical Physics |
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Authors | Van Zee, R. J. | Author |
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Ferrante, R. F. | Author |
Weltner, W. | Author |
Year | 1985 (December 15) | Volume | 83 |
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Issue | 12 |
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Publisher | AIP Publishing |
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DOI | doi:10.1063/1.449614Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 2155690 | Long-form Identifier | mindat:1:5:2155690:6 |
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GUID | 0 |
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Full Reference | Van Zee, R. J., Ferrante, R. F., Weltner, W. (1985) Si2, SiH3, and HSiO molecules: ESR at 4 K. The Journal of Chemical Physics, 83 (12). 6181-6187 doi:10.1063/1.449614 |
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Plain Text | Van Zee, R. J., Ferrante, R. F., Weltner, W. (1985) Si2, SiH3, and HSiO molecules: ESR at 4 K. The Journal of Chemical Physics, 83 (12). 6181-6187 doi:10.1063/1.449614 |
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In | (1985, December) The Journal of Chemical Physics Vol. 83 (12) AIP Publishing |
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