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Tsalikis, D. G., Baig, C., Mavrantzas, V. G., Amanatides, E., Mataras, D. (2013) A hybrid kinetic Monte Carlo method for simulating silicon films grown by plasma-enhanced chemical vapor deposition. The Journal of Chemical Physics, 139 (20). 204706pp. doi:10.1063/1.4830425

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Reference TypeJournal (article/letter/editorial)
TitleA hybrid kinetic Monte Carlo method for simulating silicon films grown by plasma-enhanced chemical vapor deposition
JournalThe Journal of Chemical Physics
AuthorsTsalikis, D. G.Author
Baig, C.Author
Mavrantzas, V. G.Author
Amanatides, E.Author
Mataras, D.Author
Year2013 (November 28)Volume139
Issue20
PublisherAIP Publishing
DOIdoi:10.1063/1.4830425Search in ResearchGate
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Mindat Ref. ID2364282Long-form Identifiermindat:1:5:2364282:7
GUID0
Full ReferenceTsalikis, D. G., Baig, C., Mavrantzas, V. G., Amanatides, E., Mataras, D. (2013) A hybrid kinetic Monte Carlo method for simulating silicon films grown by plasma-enhanced chemical vapor deposition. The Journal of Chemical Physics, 139 (20). 204706pp. doi:10.1063/1.4830425
Plain TextTsalikis, D. G., Baig, C., Mavrantzas, V. G., Amanatides, E., Mataras, D. (2013) A hybrid kinetic Monte Carlo method for simulating silicon films grown by plasma-enhanced chemical vapor deposition. The Journal of Chemical Physics, 139 (20). 204706pp. doi:10.1063/1.4830425
In(2013, November) The Journal of Chemical Physics Vol. 139 (20) AIP Publishing

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Farsari, E, Kalampounias, A G, Amanatides, E, Mataras, D (2014) ECWR plasma enhanced chemical vapour deposition of microcrystalline silicon thin films. Journal of Physics: Conference Series, 550. 12031pp. doi:10.1088/1742-6596/550/1/012031
Amanatides, E., Stamou, S., Mataras, D. (2001) Gas phase and surface kinetics in plasma enhanced chemical vapor deposition of microcrystalline silicon: The combined effect of rf power and hydrogen dilution. Journal of Applied Physics, 90 (11). 5786-5798 doi:10.1063/1.1413241
Amanatides, E., Hammad, A., Katsia, E., Mataras, D. (2005) High pressure regime of plasma enhanced deposition of microcrystalline silicon. Journal of Applied Physics, 97 (7). 73303pp. doi:10.1063/1.1866477
Bartlome, Richard, De Wolf, Stefaan, Demaurex, Bénédicte, Ballif, Christophe, Amanatides, Eleftherios, Mataras, Dimitrios (2015) Practical silicon deposition rules derived from silane monitoring during plasma-enhanced chemical vapor deposition. Journal of Applied Physics, 117 (20). 203303pp. doi:10.1063/1.4921696
Dimitrakellis, P, Amanatides, E, Mataras, D, Rapakoulias, D E (2011) Development of a hollow cathode plasma source for microcrystalline silicon thin films deposition. Journal of Physics: Conference Series, 275. 12014pp. doi:10.1088/1742-6596/275/1/012014
Mermigkis, Panagiotis G., Tsalikis, Dimitrios G., Mavrantzas, Vlasis G. (2015) Determination of the effective diffusivity of water in a poly (methyl methacrylate) membrane containing carbon nanotubes using kinetic Monte Carlo simulations. The Journal of Chemical Physics, 143 (16). 164903pp. doi:10.1063/1.4934225
Brassard, D., El Khakani, M. A. (2003) Dielectric properties of amorphous hydrogenated silicon carbide thin films grown by plasma-enhanced chemical vapor deposition. Journal of Applied Physics, 93 (7). 4066-4071 doi:10.1063/1.1555676
Battaile, C. C., Srolovitz, D. J., Butler, J. E. (1997) A kinetic Monte Carlo method for the atomic-scale simulation of chemical vapor deposition: Application to diamond. Journal of Applied Physics, 82 (12). 6293-6300 doi:10.1063/1.366532
Amanatides, E., Mataras, D., Rapakoulias, D. E. (2001) Effect of frequency in the deposition of microcrystalline silicon from silane discharges. Journal of Applied Physics, 90 (11). 5799-5807 doi:10.1063/1.1413240
Basa, D. K., Abbate, G., Ambrosone, G., Coscia, U., Marino, A. (2010) Spectroscopic ellipsometry study of hydrogenated amorphous silicon carbon alloy films deposited by plasma enhanced chemical vapor deposition. Journal of Applied Physics, 107 (2). 23502pp. doi:10.1063/1.3277016
Parsons, G. N. (1991) Selective deposition of silicon by plasma‐enhanced chemical vapor deposition using pulsed silane flow. Applied Physics Letters, 59 (20). 2546-2548 doi:10.1063/1.105948
 
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