Derby, Jeffrey J., Tao, Yutao, Reimann, Christian, Friedrich, Jochen, Jauß, Thomas, Sorgenfrei, Tina, Cröll, Arne (2017) A quantitative model with new scaling for silicon carbide particle engulfment during silicon crystal growth. Journal of Crystal Growth, 463. 100-109 doi:10.1016/j.jcrysgro.2017.02.012
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | A quantitative model with new scaling for silicon carbide particle engulfment during silicon crystal growth | ||
Journal | Journal of Crystal Growth | ||
Authors | Derby, Jeffrey J. | Author | |
Tao, Yutao | Author | ||
Reimann, Christian | Author | ||
Friedrich, Jochen | Author | ||
Jauß, Thomas | Author | ||
Sorgenfrei, Tina | Author | ||
Cröll, Arne | Author | ||
Year | 2017 (April) | Volume | 463 |
Publisher | Elsevier BV | ||
DOI | doi:10.1016/j.jcrysgro.2017.02.012Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 2913223 | Long-form Identifier | mindat:1:5:2913223:4 |
GUID | 0 | ||
Full Reference | Derby, Jeffrey J., Tao, Yutao, Reimann, Christian, Friedrich, Jochen, Jauß, Thomas, Sorgenfrei, Tina, Cröll, Arne (2017) A quantitative model with new scaling for silicon carbide particle engulfment during silicon crystal growth. Journal of Crystal Growth, 463. 100-109 doi:10.1016/j.jcrysgro.2017.02.012 | ||
Plain Text | Derby, Jeffrey J., Tao, Yutao, Reimann, Christian, Friedrich, Jochen, Jauß, Thomas, Sorgenfrei, Tina, Cröll, Arne (2017) A quantitative model with new scaling for silicon carbide particle engulfment during silicon crystal growth. Journal of Crystal Growth, 463. 100-109 doi:10.1016/j.jcrysgro.2017.02.012 | ||
In | (2017) Journal of Crystal Growth Vol. 463. Elsevier BV |
See Also
These are possibly similar items as determined by title/reference text matching only.