Potoczna-Petru, D. (1998) Effect of thermal treatment in H2 on Co films supported on silica and carbon. Materials Chemistry and Physics, 55. 224-228 doi:10.1016/s0254-0584(98)00157-6
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Effect of thermal treatment in H2 on Co films supported on silica and carbon | ||
Journal | Materials Chemistry and Physics | ||
Authors | Potoczna-Petru, D. | Author | |
Year | 1998 (September) | Volume | 55 |
Publisher | Elsevier BV | ||
DOI | doi:10.1016/s0254-0584(98)00157-6Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 3051454 | Long-form Identifier | mindat:1:5:3051454:0 |
GUID | 0 | ||
Full Reference | Potoczna-Petru, D. (1998) Effect of thermal treatment in H2 on Co films supported on silica and carbon. Materials Chemistry and Physics, 55. 224-228 doi:10.1016/s0254-0584(98)00157-6 | ||
Plain Text | Potoczna-Petru, D. (1998) Effect of thermal treatment in H2 on Co films supported on silica and carbon. Materials Chemistry and Physics, 55. 224-228 doi:10.1016/s0254-0584(98)00157-6 | ||
In | (1998, September) Materials Chemistry and Physics Vol. 55 (3) Elsevier BV |
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