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Chundak, Mykhailo, Khalakhan, Ivan, Kúš, Peter, Duchoň, Tomáš, Potin, Valérie, Cacucci, Arnaud, Tsud, Nataliya, Matolín, Vladimír, Veltruská, Kateřina (2019) Tailoring of highly porous SnO2 and SnO2-Pd thin films. Materials Chemistry and Physics, 232. 485-492 doi:10.1016/j.matchemphys.2018.11.022

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Reference TypeJournal (article/letter/editorial)
TitleTailoring of highly porous SnO2 and SnO2-Pd thin films
JournalMaterials Chemistry and Physics
AuthorsChundak, MykhailoAuthor
Khalakhan, IvanAuthor
Kúš, PeterAuthor
Duchoň, TomášAuthor
Potin, ValérieAuthor
Cacucci, ArnaudAuthor
Tsud, NataliyaAuthor
Matolín, VladimírAuthor
Veltruská, KateřinaAuthor
Year2019 (June)Volume232
PublisherElsevier BV
DOIdoi:10.1016/j.matchemphys.2018.11.022Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID3065562Long-form Identifiermindat:1:5:3065562:5
GUID0
Full ReferenceChundak, Mykhailo, Khalakhan, Ivan, Kúš, Peter, Duchoň, Tomáš, Potin, Valérie, Cacucci, Arnaud, Tsud, Nataliya, Matolín, Vladimír, Veltruská, Kateřina (2019) Tailoring of highly porous SnO2 and SnO2-Pd thin films. Materials Chemistry and Physics, 232. 485-492 doi:10.1016/j.matchemphys.2018.11.022
Plain TextChundak, Mykhailo, Khalakhan, Ivan, Kúš, Peter, Duchoň, Tomáš, Potin, Valérie, Cacucci, Arnaud, Tsud, Nataliya, Matolín, Vladimír, Veltruská, Kateřina (2019) Tailoring of highly porous SnO2 and SnO2-Pd thin films. Materials Chemistry and Physics, 232. 485-492 doi:10.1016/j.matchemphys.2018.11.022
In(2019) Materials Chemistry and Physics Vol. 232. Elsevier BV

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