Fukuda, Kentaro, Hanada, Teiichi, Tanabe, Setsuhisa, Yao, Takeshi (2004) Physical Properties and Structure of rf-Sputtered Amorphous Films in the System Al2O3-Y2O3. Journal of the American Ceramic Society, 85 (4). 915-920 doi:10.1111/j.1151-2916.2002.tb00192.x
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Physical Properties and Structure of rf-Sputtered Amorphous Films in the System Al2O3-Y2O3 | ||
Journal | Journal of the American Ceramic Society | ||
Authors | Fukuda, Kentaro | Author | |
Hanada, Teiichi | Author | ||
Tanabe, Setsuhisa | Author | ||
Yao, Takeshi | Author | ||
Year | 2004 (December 20) | Volume | 85 |
Issue | 4 | ||
Publisher | Wiley | ||
DOI | doi:10.1111/j.1151-2916.2002.tb00192.xSearch in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 4096303 | Long-form Identifier | mindat:1:5:4096303:7 |
GUID | 0 | ||
Full Reference | Fukuda, Kentaro, Hanada, Teiichi, Tanabe, Setsuhisa, Yao, Takeshi (2004) Physical Properties and Structure of rf-Sputtered Amorphous Films in the System Al2O3-Y2O3. Journal of the American Ceramic Society, 85 (4). 915-920 doi:10.1111/j.1151-2916.2002.tb00192.x | ||
Plain Text | Fukuda, Kentaro, Hanada, Teiichi, Tanabe, Setsuhisa, Yao, Takeshi (2004) Physical Properties and Structure of rf-Sputtered Amorphous Films in the System Al2O3-Y2O3. Journal of the American Ceramic Society, 85 (4). 915-920 doi:10.1111/j.1151-2916.2002.tb00192.x | ||
In | (2004, December) Journal of the American Ceramic Society Vol. 85 (4) Wiley |
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