Reference Type | Journal (article/letter/editorial) |
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Title | Optical and electron microscopy of sapphire irradiated with an applied electric field at 450°C |
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Journal | Journal of Nuclear Materials |
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Authors | Pells, G.P. | Author |
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Hodgson, E.R. | Author |
Year | 1995 (November) | Volume | 226 |
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Issue | 3 |
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Publisher | Elsevier BV |
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DOI | doi:10.1016/0022-3115(96)80001-8Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 4151880 | Long-form Identifier | mindat:1:5:4151880:7 |
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GUID | 0 |
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Full Reference | Pells, G.P., Hodgson, E.R. (1995) Optical and electron microscopy of sapphire irradiated with an applied electric field at 450°C. Journal of Nuclear Materials, 226 (3). 286-292 doi:10.1016/0022-3115(96)80001-8 |
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Plain Text | Pells, G.P., Hodgson, E.R. (1995) Optical and electron microscopy of sapphire irradiated with an applied electric field at 450°C. Journal of Nuclear Materials, 226 (3). 286-292 doi:10.1016/0022-3115(96)80001-8 |
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In | (1995, November) Journal of Nuclear Materials Vol. 226 (3) Elsevier BV |
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