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Schlüter, M., Hopf, C., Schwarz-Selinger, T., Jacob, W. (2008) Temperature dependence of the chemical sputtering of amorphous hydrogenated carbon films by hydrogen. Journal of Nuclear Materials, 376 (1). 33-37 doi:10.1016/j.jnucmat.2008.02.002

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Reference TypeJournal (article/letter/editorial)
TitleTemperature dependence of the chemical sputtering of amorphous hydrogenated carbon films by hydrogen
JournalJournal of Nuclear Materials
AuthorsSchlüter, M.Author
Hopf, C.Author
Schwarz-Selinger, T.Author
Jacob, W.Author
Year2008 (May)Volume376
Issue1
PublisherElsevier BV
DOIdoi:10.1016/j.jnucmat.2008.02.002Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID4159545Long-form Identifiermindat:1:5:4159545:3
GUID0
Full ReferenceSchlüter, M., Hopf, C., Schwarz-Selinger, T., Jacob, W. (2008) Temperature dependence of the chemical sputtering of amorphous hydrogenated carbon films by hydrogen. Journal of Nuclear Materials, 376 (1). 33-37 doi:10.1016/j.jnucmat.2008.02.002
Plain TextSchlüter, M., Hopf, C., Schwarz-Selinger, T., Jacob, W. (2008) Temperature dependence of the chemical sputtering of amorphous hydrogenated carbon films by hydrogen. Journal of Nuclear Materials, 376 (1). 33-37 doi:10.1016/j.jnucmat.2008.02.002
In(2008, May) Journal of Nuclear Materials Vol. 376 (1) Elsevier BV

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Salançon, E., Dürbeck, T., Schwarz-Selinger, T., Genoese, F., Jacob, W. (2008) Redeposition of amorphous hydrogenated carbon films during thermal decomposition. Journal of Nuclear Materials, 376 (2). 160-168 doi:10.1016/j.jnucmat.2008.02.070
Hopf, C, Schlüter, M, Schwarz-Selinger, T, von Toussaint, U, Jacob, W (2008) Chemical sputtering of carbon films by simultaneous irradiation with argon ions and molecular oxygen. New Journal of Physics, 10. 93022pp. doi:10.1088/1367-2630/10/9/093022
Salançon, E., Dürbeck, T., Schwarz-Selinger, T., Jacob, W. (2007) Reactivity of soft amorphous hydrogenated carbon films in ambient atmosphere. Journal of Nuclear Materials, 363. 944-948 doi:10.1016/j.jnucmat.2007.01.118
Schwarz-Selinger, Thomas, Hopf, Christian, Sun, Chao, Jacob, Wolfgang (2007) Growth and erosion of amorphous carbon (a-C:H) films by low-temperature laboratory plasmas containing H and N mixtures. Journal of Nuclear Materials, 363. 174-178 doi:10.1016/j.jnucmat.2007.01.005
Wang, P., Jacob, W., Balden, M., Manhard, A., Schwarz-Selinger, T. (2012) Erosion of tungsten-doped amorphous carbon films in oxygen plasma. Journal of Nuclear Materials, 420 (1). 101-109 doi:10.1016/j.jnucmat.2011.09.023
Hopf, C., Schwarz-Selinger, T., Jacob, W., von Keudell, A. (2000) Surface loss probabilities of hydrocarbon radicals on amorphous hydrogenated carbon film surfaces. Journal of Applied Physics, 87 (6). 2719-2725 doi:10.1063/1.372246
Hopf, C., Jacob, W. (2005) Bombardment of graphite with hydrogen isotopes: A model for the energy dependence of the chemical sputtering yield. Journal of Nuclear Materials, 342 (1). 141-147 doi:10.1016/j.jnucmat.2005.04.003
von Keudell, A., Schwarz-Selinger, T., Jacob, W. (2001) Simultaneous interaction of methyl radicals and atomic hydrogen with amorphous hydrogenated carbon films. Journal of Applied Physics, 89 (5). 2979-2986 doi:10.1063/1.1343894
Schlüter, M, Hopf, C, Jacob, W (2008) Chemical sputtering of carbon by combined exposure to nitrogen ions and atomic hydrogen. New Journal of Physics, 10. 53037pp. doi:10.1088/1367-2630/10/5/053037
Oehrlein, G. S., Schwarz-Selinger, T., Schmid, K., Schlüter, M., Jacob, W. (2010) Stages in the interaction of deuterium atoms with amorphous hydrogenated carbon films: Isotope exchange, soft-layer formation, and steady-state erosion. Journal of Applied Physics, 108 (4). 43307pp. doi:10.1063/1.3474988
von Keudell, A., Schwarz-Selinger, T., Meier, M., Jacob, W. (2000) Direct identification of the synergism between methyl radicals and atomic hydrogen during growth of amorphous hydrogenated carbon films. Applied Physics Letters, 76 (6). 676-678 doi:10.1063/1.125858
 
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