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Hicks, Jason C., Dabestani, Reza, Buchanan, A. C., Jones, Christopher W. (2006) Spacing and Site Isolation of Amine Groups in 3-Aminopropyl-Grafted Silica Materials:  The Role of Protecting Groups. Chemistry of Materials, 18. 5022-5032 doi:10.1021/cm061382w

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Reference TypeJournal (article/letter/editorial)
TitleSpacing and Site Isolation of Amine Groups in 3-Aminopropyl-Grafted Silica Materials:  The Role of Protecting Groups
JournalChemistry of Materials
AuthorsHicks, Jason C.Author
Dabestani, RezaAuthor
Buchanan, A. C.Author
Jones, Christopher W.Author
Year2006 (October)Volume18
PublisherAmerican Chemical Society (ACS)
DOIdoi:10.1021/cm061382wSearch in ResearchGate
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Mindat Ref. ID4301211Long-form Identifiermindat:1:5:4301211:2
GUID0
Full ReferenceHicks, Jason C., Dabestani, Reza, Buchanan, A. C., Jones, Christopher W. (2006) Spacing and Site Isolation of Amine Groups in 3-Aminopropyl-Grafted Silica Materials:  The Role of Protecting Groups. Chemistry of Materials, 18. 5022-5032 doi:10.1021/cm061382w
Plain TextHicks, Jason C., Dabestani, Reza, Buchanan, A. C., Jones, Christopher W. (2006) Spacing and Site Isolation of Amine Groups in 3-Aminopropyl-Grafted Silica Materials:  The Role of Protecting Groups. Chemistry of Materials, 18. 5022-5032 doi:10.1021/cm061382w
In(2006) Chemistry of Materials Vol. 18. American Chemical Society (ACS)


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