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Chang, Chih-hung, Chang, Yu-Jen, Lee, Doo-Hyoung, Ryu, Si-Ok, Lee, Tae-Jin (2004) Characterization and Application of Semiconductor Thin Films Deposited by Chemical Bath Deposition. Microscopy and Microanalysis, 10. 610-611 doi:10.1017/s1431927604883077

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Reference TypeJournal (article/letter/editorial)
TitleCharacterization and Application of Semiconductor Thin Films Deposited by Chemical Bath Deposition
JournalMicroscopy and Microanalysis
AuthorsChang, Chih-hungAuthor
Chang, Yu-JenAuthor
Lee, Doo-HyoungAuthor
Ryu, Si-OkAuthor
Lee, Tae-JinAuthor
Year2004 (August)Volume10
PublisherCambridge University Press (CUP)
DOIdoi:10.1017/s1431927604883077Search in ResearchGate
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Mindat Ref. ID4824770Long-form Identifiermindat:1:5:4824770:4
GUID0
Full ReferenceChang, Chih-hung, Chang, Yu-Jen, Lee, Doo-Hyoung, Ryu, Si-Ok, Lee, Tae-Jin (2004) Characterization and Application of Semiconductor Thin Films Deposited by Chemical Bath Deposition. Microscopy and Microanalysis, 10. 610-611 doi:10.1017/s1431927604883077
Plain TextChang, Chih-hung, Chang, Yu-Jen, Lee, Doo-Hyoung, Ryu, Si-Ok, Lee, Tae-Jin (2004) Characterization and Application of Semiconductor Thin Films Deposited by Chemical Bath Deposition. Microscopy and Microanalysis, 10. 610-611 doi:10.1017/s1431927604883077
In(2004) Microscopy and Microanalysis Vol. 10. Cambridge University Press (CUP)

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