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Oertel, H., Huber, H.‐L., Schmidt, M. (1989) Exposure instrumentation for the application of x‐ray lithography using synchrotron radiation. Review of Scientific Instruments, 60 (7). 2140-2143 doi:10.1063/1.1140803

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Reference TypeJournal (article/letter/editorial)
TitleExposure instrumentation for the application of x‐ray lithography using synchrotron radiation
JournalReview of Scientific Instruments
AuthorsOertel, H.Author
Huber, H.‐L.Author
Schmidt, M.Author
Year1989 (July)Volume60
Issue7
PublisherAIP Publishing
DOIdoi:10.1063/1.1140803Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID4853668Long-form Identifiermindat:1:5:4853668:0
GUID0
Full ReferenceOertel, H., Huber, H.‐L., Schmidt, M. (1989) Exposure instrumentation for the application of x‐ray lithography using synchrotron radiation. Review of Scientific Instruments, 60 (7). 2140-2143 doi:10.1063/1.1140803
Plain TextOertel, H., Huber, H.‐L., Schmidt, M. (1989) Exposure instrumentation for the application of x‐ray lithography using synchrotron radiation. Review of Scientific Instruments, 60 (7). 2140-2143 doi:10.1063/1.1140803
In(1989, July) Review of Scientific Instruments Vol. 60 (7) AIP Publishing

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Oertel, H. (1989) Parameters of exposure equipment for SOR x‐ray lithography (abstract). Review of Scientific Instruments, 60 (7). 2167 doi:10.1063/1.1140810
Itoh, Junji, Kanayama, Toshihiko, Atoda, Nobufumi, Hoh, Koichiro (1989) Fine‐alignment exposure system for synchrotron x‐ray lithography (invited). Review of Scientific Instruments, 60 (7). 1638-1642 doi:10.1063/1.1141049
Moser, H. O., Ehrfeld, W. (1989) Prospective nonlithographic applications of a synchrotron radiation source for deep‐etch lithography. Review of Scientific Instruments, 60 (7). 2164-2166 doi:10.1063/1.1140809
Cullmann, E., Kooper, K. A. (1989) Vertical x‐ray stepper for synchrotron‐based production lithography (abstract). Review of Scientific Instruments, 60 (7). 2167 doi:10.1063/1.1140811
Mandai, S., Hoshi, Y., Kohno, Y. (1989) Development of compact synchrotron light source for x‐ray lithography (abstract). Review of Scientific Instruments, 60 (7). 1795 doi:10.1063/1.1140906
D’Amico, K. L., Deckman, H. W., Dunsmuir, J. H., Flannery, B. P., Roberge, W. G. (1989) X‐ray microtomography with monochromatic synchrotron radiation (invited). Review of Scientific Instruments, 60 (7). 1524-1526 doi:10.1063/1.1140975
Ihringer, J., Wroblewski, T. (1989) X‐ray diffraction by moving objects: A new application of synchrotron radiation. Review of Scientific Instruments, 60 (7). 2354-2355 doi:10.1063/1.1140767
Laclare, Jean‐Louis (1989) ESRF x‐ray synchrotron radiation source (invited). Review of Scientific Instruments, 60 (7). 1399-1402 doi:10.1063/1.1141002
Cullmann, E., Vach, W., Cooper, K. (1989) Scanning x‐ray stepper for synchrotron radiation. Review of Scientific Instruments, 60 (7). 2150-2152 doi:10.1063/1.1141063
Yoshizawa, M., Sugawara, H., Jyohtake, K., Yamagishi, S., Fukamachi, T., Kawamura, T., Nakajima, T. (1989) Fast measuring system of energy dispersive x‐ray diffraction intensity for synchrotron radiation (abstract). Review of Scientific Instruments, 60 (7). 2443 doi:10.1063/1.1140746
Mochiji, Kozo, Sooda, Yasunari, Ito, Masaaki, Kimura, Takeshi (1989) Soft x‐ray spectroscopy of polymer resist using synchrotron radiation. Review of Scientific Instruments, 60 (7). 2160-2163 doi:10.1063/1.1140808
 
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