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Okuno, Yoshihiro, Yagura, Shinya, Ishikura, Hiroshi, Fujita, Hiroharu (1993) Simplified cascaded arc discharge source for production of a processing plasma. Review of Scientific Instruments, 64 (4). 990-995 doi:10.1063/1.1144102

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Reference TypeJournal (article/letter/editorial)
TitleSimplified cascaded arc discharge source for production of a processing plasma
JournalReview of Scientific Instruments
AuthorsOkuno, YoshihiroAuthor
Yagura, ShinyaAuthor
Ishikura, HiroshiAuthor
Fujita, HiroharuAuthor
Year1993 (April)Volume64
Issue4
PublisherAIP Publishing
DOIdoi:10.1063/1.1144102Search in ResearchGate
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Mindat Ref. ID4865005Long-form Identifiermindat:1:5:4865005:0
GUID0
Full ReferenceOkuno, Yoshihiro, Yagura, Shinya, Ishikura, Hiroshi, Fujita, Hiroharu (1993) Simplified cascaded arc discharge source for production of a processing plasma. Review of Scientific Instruments, 64 (4). 990-995 doi:10.1063/1.1144102
Plain TextOkuno, Yoshihiro, Yagura, Shinya, Ishikura, Hiroshi, Fujita, Hiroharu (1993) Simplified cascaded arc discharge source for production of a processing plasma. Review of Scientific Instruments, 64 (4). 990-995 doi:10.1063/1.1144102
In(1993, April) Review of Scientific Instruments Vol. 64 (4) AIP Publishing

See Also

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Okuno, Yoshihiro, Ishikura, Hiroshi, Fujita, Hiroharu (1992) Production of sheet plasma with dc magnetron discharge source. Review of Scientific Instruments, 63 (1). 44-47 doi:10.1063/1.1142727
Okuno, Yoshihiro, Ishikura, Hiroshi, Fujita, Hiroharu (1992) Sheet plasma production by means of rf magnetron discharges. Review of Scientific Instruments, 63 (7). 3725-3728 doi:10.1063/1.1143604
Okuno, Yoshihiro, Yagura, Shinya, Fujita, Hiroharu (1991) Observation of a magnetized low‐pressure rf plasma for thin‐film preparation. Journal of Applied Physics, 69 (1). 146-150 doi:10.1063/1.347735
Okuno, Yoshihiro, Yagura, Shinya, Fujita, Hiroharu (1989) Observation of sheath structure near a rf electrode in a magnetized afterglow plasma. Journal of Applied Physics, 65 (6). 2205-2208 doi:10.1063/1.342831
Yagura, Shinya, Okuno, Yoshihiro, Ohtsu, Yasunori, Fujita, Hiroharu (1992) Measurement of Electron Energy Distribution Function in a Low-Pressure rf Discharge Plasma. Japanese Journal of Applied Physics, 31. 1503-1504 doi:10.1143/jjap.31.1503
Fujita, Hiroharu, Okuno, Yoshihiro, Ohtsu, Yasunori, Yagura, Shinya (1990) Control of plasma parameters and electric fields in a microwave‐rf hybrid plasma. Journal of Applied Physics, 67 (10). 6114-6117 doi:10.1063/1.345172
Fujita, Hiroharu, Yagura, Shinya (1988) Production of a low‐pressure processing plasma with ion beam injection for thin‐film preparation. Applied Physics Letters, 52 (23). 1956-1958 doi:10.1063/1.99588
Murata, Kenji, Okuno, Yoshihiro, Fujita, Hiroharu (1994) Production of high‐density sheet plasma by an rf magnetron device with high‐frequency operation. Review of Scientific Instruments, 65 (3). 673-677 doi:10.1063/1.1145137
Okuno, Yoshihiro, Ohtsu, Yasunori, Komatsu, Chihiro, Fujita, Hiroharu (1993) Measurements of electron energy distribution function in an asymmetric radio‐frequency discharge plasma. Journal of Applied Physics, 73 (4). 1612-1616 doi:10.1063/1.353193
Ikushima, Takayuki, Okuno, Yoshihiro, Fujita, Hiroharu (1994) Production of large diameter microwave plasma using an annular slot antenna. Applied Physics Letters, 64 (1). 25-27 doi:10.1063/1.110905
Okuno, Yoshihiro, Ohtsu, Yasunori, Fujita, Hiroharu (1994) Electron acceleration resonant with sheath motion in a low‐pressure radio frequency discharge. Applied Physics Letters, 64 (13). 1623-1625 doi:10.1063/1.111858
 
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