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Wang, Wei‐Xiang, Li, Dao‐Huo, Liu, Zong‐Cai, Liu, Song‐Hao (1993) Pressure sensitive capacitance study in laser‐induced chemical vapor deposition processed nanosized Si3N4. Review of Scientific Instruments, 64 (6). 1657-1658 doi:10.1063/1.1144044

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Reference TypeJournal (article/letter/editorial)
TitlePressure sensitive capacitance study in laser‐induced chemical vapor deposition processed nanosized Si3N4
JournalReview of Scientific Instruments
AuthorsWang, Wei‐XiangAuthor
Li, Dao‐HuoAuthor
Liu, Zong‐CaiAuthor
Liu, Song‐HaoAuthor
Year1993 (June)Volume64
Issue6
PublisherAIP Publishing
DOIdoi:10.1063/1.1144044Search in ResearchGate
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Mindat Ref. ID4865376Long-form Identifiermindat:1:5:4865376:5
GUID0
Full ReferenceWang, Wei‐Xiang, Li, Dao‐Huo, Liu, Zong‐Cai, Liu, Song‐Hao (1993) Pressure sensitive capacitance study in laser‐induced chemical vapor deposition processed nanosized Si3N4. Review of Scientific Instruments, 64 (6). 1657-1658 doi:10.1063/1.1144044
Plain TextWang, Wei‐Xiang, Li, Dao‐Huo, Liu, Zong‐Cai, Liu, Song‐Hao (1993) Pressure sensitive capacitance study in laser‐induced chemical vapor deposition processed nanosized Si3N4. Review of Scientific Instruments, 64 (6). 1657-1658 doi:10.1063/1.1144044
In(1993, June) Review of Scientific Instruments Vol. 64 (6) AIP Publishing


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