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Sohda, Yasunari, Ohta, Hiroya, Saitou, Norio (2002) A method for evaluating aberration in the crossover image in mask irradiation optics of electron beam. Review of Scientific Instruments, 73 (2). 270-276 doi:10.1063/1.1431442

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Reference TypeJournal (article/letter/editorial)
TitleA method for evaluating aberration in the crossover image in mask irradiation optics of electron beam
JournalReview of Scientific Instruments
AuthorsSohda, YasunariAuthor
Ohta, HiroyaAuthor
Saitou, NorioAuthor
Year2002 (February)Volume73
Issue2
PublisherAIP Publishing
DOIdoi:10.1063/1.1431442Search in ResearchGate
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Mindat Ref. ID4886957Long-form Identifiermindat:1:5:4886957:9
GUID0
Full ReferenceSohda, Yasunari, Ohta, Hiroya, Saitou, Norio (2002) A method for evaluating aberration in the crossover image in mask irradiation optics of electron beam. Review of Scientific Instruments, 73 (2). 270-276 doi:10.1063/1.1431442
Plain TextSohda, Yasunari, Ohta, Hiroya, Saitou, Norio (2002) A method for evaluating aberration in the crossover image in mask irradiation optics of electron beam. Review of Scientific Instruments, 73 (2). 270-276 doi:10.1063/1.1431442
In(2002, February) Review of Scientific Instruments Vol. 73 (2) AIP Publishing

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Ohta, Hiroya, Sohda, Yasunari, Saitou, Norio (2002) Design and Evaluation of an Electron Objective Lens System with Two Lenses and Two Deflectors. Japanese Journal of Applied Physics, 41. 4127-4131 doi:10.1143/jjap.41.4127
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Sohda, Yasunari, Tanimoto, Sayaka, Ohta, Hiroya (2007) Simulation of Limited-Area Cathode as Mask-Irradiation Source. Japanese Journal of Applied Physics, 46 (11) 7504-7508 doi:10.1143/jjap.46.7504
Nagata, Kouji, Ohta, Hiroya, Morimura, Toshiyuki, Okumura, Masahide, Saitou, Norio (1995) Active Vibration Correction in Electron Beam Lithography System. Japanese Journal of Applied Physics, 34. 6639-6643 doi:10.1143/jjap.34.6639
Someda, Yasuhiro, Sohda, Yasunari, Saitou, Norio, Itoh, Hiroyuki, Katoh, Shin'ichi (1995) Analysis of Eddy Current Effects in an Electron Optical Column. Japanese Journal of Applied Physics, 34. 6651-6654 doi:10.1143/jjap.34.6651
Ohta, Hiroya, Matsuzaka, Takashi, Saitou, Norio, Kawasaki, Katsuhiro, Kohno, Toshihiko, Hoga, Morihisa (1993) Stitching Error Analysis in an Electron Beam Lithography System: Column Vibration Effect. Japanese Journal of Applied Physics, 32. 6044-6048 doi:10.1143/jjap.32.6044
Matsuzaka, Takashi, Ohta, Hiroya, Saitou, Norio, Kawasaki, Katsuhiro, Kohno, Toshihiko, Hoga, Morihisa (1993) The Requirements for Future Electron-Beam Reticle Fabrication Systems from an Error Analysis Viewpoint. Japanese Journal of Applied Physics, 32. 6018-6022 doi:10.1143/jjap.32.6018
Ohta, Hiroya, Matsuzaka, Takashi, Saitou, Norio, Kawasaki, Katsuhiro, Nakamura, Kazumitsu, Kohno, Toshihiko, Hoga, Morihisa (1992) Error Analysis in Electron Beam Lithography System -Thermal Effects on Positioning Accuracy-. Japanese Journal of Applied Physics, 31. 4253-4256 doi:10.1143/jjap.31.4253
Ejiri, A. (2002) Four-beam correlation method for local fluctuation measurements in plasmas. Review of Scientific Instruments, 73 (4). 1766-1774 doi:10.1063/1.1453500
Ide-Ektessabi, Ari, Watanabe, Yoshinori (2002) Temperature distribution in polymeric films during ion beam irradiation. Review of Scientific Instruments, 73 (2). 849-851 doi:10.1063/1.1429786
Sohda, Yasunari, Someda, Yasuhiro, Satoh, Hidetoshi, Nakayama, Yoshinori, Saitou, Norio, Itoh, Hiroyuki (1994) Cell Projection Lithography with Scattering Contrast. Japanese Journal of Applied Physics, 33. 6940-6945 doi:10.1143/jjap.33.6940
 
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