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Thornburg, D. D., Wayman, C. M. (1971) Temperature Changes in Thin Films during Growth by Physical Vapor Deposition. I. Theoretical. Journal of Applied Physics, 42 (10). 4063-4070 doi:10.1063/1.1659725

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Reference TypeJournal (article/letter/editorial)
TitleTemperature Changes in Thin Films during Growth by Physical Vapor Deposition. I. Theoretical
JournalJournal of Applied Physics
AuthorsThornburg, D. D.Author
Wayman, C. M.Author
Year1971 (September)Volume42
Issue10
PublisherAIP Publishing
DOIdoi:10.1063/1.1659725Search in ResearchGate
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Mindat Ref. ID4965589Long-form Identifiermindat:1:5:4965589:4
GUID0
Full ReferenceThornburg, D. D., Wayman, C. M. (1971) Temperature Changes in Thin Films during Growth by Physical Vapor Deposition. I. Theoretical. Journal of Applied Physics, 42 (10). 4063-4070 doi:10.1063/1.1659725
Plain TextThornburg, D. D., Wayman, C. M. (1971) Temperature Changes in Thin Films during Growth by Physical Vapor Deposition. I. Theoretical. Journal of Applied Physics, 42 (10). 4063-4070 doi:10.1063/1.1659725
In(1971, September) Journal of Applied Physics Vol. 42 (10) AIP Publishing

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Thornburg, D. D., Wayman, C. M. (1971) Temperature Changes in Thin Films during Growth by Physical Vapor Deposition. II. Experimental. Journal of Applied Physics, 42 (10). 4071-4079 doi:10.1063/1.1659726
Belous, M. V., Wayman, C. M. (1967) Temperature Changes in Thin Metal Films during Vapor Deposition. Journal of Applied Physics, 38 (13). 5119-5124 doi:10.1063/1.1709287
Mukherjee, S., Zhou, C. M., Gall, D. (2009) Temperature-induced chaos during nanorod growth by physical vapor deposition. Journal of Applied Physics, 105 (9). 94318pp. doi:10.1063/1.3116720
Thornburg, D. D., Wayman, C. M. (1969) Thermoelectric Power of Vacuumā€Evaporated Auā€“Ni Thinā€Film Thermocouples. Journal of Applied Physics, 40 (7). 3007-3013 doi:10.1063/1.1658114
Thornburg, D. D., Wayman, C. M. (1969) Quantum and classical size effects in the thermoelectric power of thin bismuth films. Philosophical Magazine, 20 (168). 1153-1161 doi:10.1080/14786436908228201
Rosenberg, R., Ohring, M. (1971) Void Formation and Growth During Electromigration in Thin Films. Journal of Applied Physics, 42 (13). 5671-5679 doi:10.1063/1.1659998
Thornburg, D. D., Wayman, C. M. (1973) Specimen temperature increases during transmission electron microscopy. physica status solidi (a), 15 (2). 449-453 doi:10.1002/pssa.2210150209
Ivanov, P. G., Watts, S. M., Lind, D. M. (2001) Epitaxial growth of CrO2 thin films by chemical-vapor deposition from a Cr8O21 precursor. Journal of Applied Physics, 89 (2). 1035-1040 doi:10.1063/1.1331343
Kasdan, A., Goshorn, D. P. (1983) Ion bombardment control of morphology during the growth of hydrogenated amorphous silicon thin films by reactive ion beam deposition. Applied Physics Letters, 42 (1). 36-38 doi:10.1063/1.93756
Bai, G.-R., Tsu, I-Fei, Wang, A., Foster, C. M., Murray, C. E., Dravid, V. P. (1998) In situ growth of highly oriented Pb(Zr0.5Ti0.5)O3 thin films by low-temperature metalā€“organic chemical vapor deposition. Applied Physics Letters, 72 (13). 1572-1574 doi:10.1063/1.121118
Ravi Chandra Raju, N, Jagadeesh Kumar, K, Subrahmanyam, A (2009) Physical properties of silver oxide thin films by pulsed laser deposition: effect of oxygen pressure during growth. Journal of Physics D: Applied Physics, 42. 135411pp. doi:10.1088/0022-3727/42/13/135411
 
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