Reference Type | Journal (article/letter/editorial) |
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Title | Intrinsic and Field‐Induced Anisotropy of Si‐Doped YIG from 4.2 to 300 K |
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Journal | Journal of Applied Physics |
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Authors | Churchill, R. J. | Author |
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Flanders, P. J. | Author |
Graham, C. D. | Author |
Year | 1971 (March 15) | Volume | 42 |
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Issue | 4 |
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Publisher | AIP Publishing |
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DOI | doi:10.1063/1.1660288Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 4967863 | Long-form Identifier | mindat:1:5:4967863:7 |
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GUID | 0 |
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Full Reference | Churchill, R. J., Flanders, P. J., Graham, C. D. (1971) Intrinsic and Field‐Induced Anisotropy of Si‐Doped YIG from 4.2 to 300 K. Journal of Applied Physics, 42 (4). 1451 doi:10.1063/1.1660288 |
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Plain Text | Churchill, R. J., Flanders, P. J., Graham, C. D. (1971) Intrinsic and Field‐Induced Anisotropy of Si‐Doped YIG from 4.2 to 300 K. Journal of Applied Physics, 42 (4). 1451 doi:10.1063/1.1660288 |
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In | (1971, March) Journal of Applied Physics Vol. 42 (4) AIP Publishing |
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