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Alba de Sánchez, N., Rincón, C., Zambrano, G., Prieto, P. (2000) Characterization of the Plasma during the Growth of CNx Films by RF Magnetron Sputtering. physica status solidi (b), 220 (1). 697-701 doi:10.1002/1521-3951(200007)220:1<697::aid-pssb697>3.0.co;2-q

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Reference TypeJournal (article/letter/editorial)
TitleCharacterization of the Plasma during the Growth of CNx Films by RF Magnetron Sputtering
Journalphysica status solidi (b)
AuthorsAlba de Sánchez, N.Author
Rincón, C.Author
Zambrano, G.Author
Prieto, P.Author
Year2000 (July)Volume220
Issue1
PublisherWiley
DOIdoi:10.1002/1521-3951(200007)220:1<697::aid-pssb697>3.0.co;2-qSearch in ResearchGate
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Mindat Ref. ID5020281Long-form Identifiermindat:1:5:5020281:0
GUID0
Full ReferenceAlba de Sánchez, N., Rincón, C., Zambrano, G., Prieto, P. (2000) Characterization of the Plasma during the Growth of CNx Films by RF Magnetron Sputtering. physica status solidi (b), 220 (1). 697-701 doi:10.1002/1521-3951(200007)220:1<697::aid-pssb697>3.0.co;2-q
Plain TextAlba de Sánchez, N., Rincón, C., Zambrano, G., Prieto, P. (2000) Characterization of the Plasma during the Growth of CNx Films by RF Magnetron Sputtering. physica status solidi (b), 220 (1). 697-701 doi:10.1002/1521-3951(200007)220:13.0.co;2-q
In(2000, July) physica status solidi (b) Vol. 220 (1) Wiley

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