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Joseph, B. (1976) The electron injection from Si into SiO2 due to a mobile ion induced internal field. physica status solidi (a), 38 (2). doi:10.1002/pssa.2210380248

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Reference TypeJournal (article/letter/editorial)
TitleThe electron injection from Si into SiO2 due to a mobile ion induced internal field
Journalphysica status solidi (a)
AuthorsJoseph, B.Author
Year1976 (December 16)Volume38
Issue2
PublisherWiley
DOIdoi:10.1002/pssa.2210380248Search in ResearchGate
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Mindat Ref. ID5053018Long-form Identifiermindat:1:5:5053018:4
GUID0
Full ReferenceJoseph, B. (1976) The electron injection from Si into SiO2 due to a mobile ion induced internal field. physica status solidi (a), 38 (2). doi:10.1002/pssa.2210380248
Plain TextJoseph, B. (1976) The electron injection from Si into SiO2 due to a mobile ion induced internal field. physica status solidi (a), 38 (2). doi:10.1002/pssa.2210380248
In(1976, December) physica status solidi (a) Vol. 38 (2) Wiley

See Also

These are possibly similar items as determined by title/reference text matching only.

Joseph, B. (1979) The time dependence of the flatband voltage shift of MOS capacitors caused by the injection of minority carriers from Si into SiO2. physica status solidi (a), 51 (1). doi:10.1002/pssa.2210510139
Hasselkamp, D., Scharmann, A. (1983) Ion-Induced Electron Emission from Carbon. physica status solidi (a), 79 (2). doi:10.1002/pssa.2210790260
Jain, G. C., Prasad, A., Chakravarty, B. C. (1978) Diffusion of Ga into Si through SiO2. physica status solidi (a), 46 (2). doi:10.1002/pssa.2210460258
Kiss, S. (1976) Coherency loss of θ′ phase due to deformation. physica status solidi (a), 38 (1). doi:10.1002/pssa.2210380150
Litvinenko, S. A., Sokolov, V. I. (1989) Formation of pores in thermal SiO2 due to internal mechanical stress relaxation. physica status solidi (a), 116 (2). 615-620 doi:10.1002/pssa.2211160219
(1976) Masthead. physica status solidi (a), 38 (2). doi:10.1002/pssa.2210380201
(1976) Erratum. physica status solidi (a), 38 (2). doi:10.1002/pssa.2210380261
Hrivnák, L. (1976) Injection of electrons into semi-insulating GaAs. physica status solidi (a), 37 (1). doi:10.1002/pssa.2210370143
(1976) Erratum. physica status solidi (a), 38 (2). 781 doi:10.1002/pssa.2210380241
Ullrich, J., Müllner, H. (1976) Temperature dependence of internal friction in copper due to oxygen contamination. physica status solidi (a), 34 (1). doi:10.1002/pssa.2210340150
Krause, H. (1976) Electron injection and trap filling in insulating layers. physica status solidi (a), 36 (2). 705-715 doi:10.1002/pssa.2210360232
 
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