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Wang, W. H., Bai, H. Y., Wang, W. K. (1993) Interdiffusion study of amorphous Ni–Si multilayer at low temperature. Journal of Applied Physics, 74 (4). 2471-2474 doi:10.1063/1.354684

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Reference TypeJournal (article/letter/editorial)
TitleInterdiffusion study of amorphous Ni–Si multilayer at low temperature
JournalJournal of Applied Physics
AuthorsWang, W. H.Author
Bai, H. Y.Author
Wang, W. K.Author
Year1993 (August 15)Volume74
Issue4
PublisherAIP Publishing
DOIdoi:10.1063/1.354684Search in ResearchGate
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Mindat Ref. ID5065237Long-form Identifiermindat:1:5:5065237:0
GUID0
Full ReferenceWang, W. H., Bai, H. Y., Wang, W. K. (1993) Interdiffusion study of amorphous Ni–Si multilayer at low temperature. Journal of Applied Physics, 74 (4). 2471-2474 doi:10.1063/1.354684
Plain TextWang, W. H., Bai, H. Y., Wang, W. K. (1993) Interdiffusion study of amorphous Ni–Si multilayer at low temperature. Journal of Applied Physics, 74 (4). 2471-2474 doi:10.1063/1.354684
In(1993, August) Journal of Applied Physics Vol. 74 (4) AIP Publishing

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Wang, W. H., Bai, H. Y., Zhang, Y., Chen, H., Wang, W. K. (1993) Solid‐state amorphization reaction in polycrystalline Ni and amorphous Si multilayer. Journal of Applied Physics, 73 (11). 7217-7221 doi:10.1063/1.352395
Wang, W. H., Bai, H. Y., Zhang, Y., Wang, W. K. (1993) Phase selection in interfacial reaction of Ni/amorphous Si multilayers. Journal of Applied Physics, 73 (9). 4313-4318 doi:10.1063/1.352814
Bai, H. Y., Wang, W. H., Chen, H., Zhang, Y., Wang, W. K. (1993) Comparison of Interdiffusion Behavior in MoSi and TiSi Multilayers. physica status solidi (a), 136 (2). 411-421 doi:10.1002/pssa.2211360214
Wang, W. H., Wang, W. K. (1994) Silicide formation in Co/amorphous Si multilayers. Journal of Applied Physics, 76 (3). 1578-1584 doi:10.1063/1.357736
Wang, X. C., Mi, W. B., Jiang, E. Y., Bai, H. L. (2006) Enhanced low-temperature magnetoresistance in facing-target reactive sputtered Ni–CNx composite films. Applied Physics Letters, 89 (24). 242502pp. doi:10.1063/1.2408632
Zhao, K., Xia, X. X., Bai, H. Y., Zhao, D. Q., Wang, W. H. (2011) Room temperature homogeneous flow in a bulk metallic glass with low glass transition temperature. Applied Physics Letters, 98 (14). 141913pp. doi:10.1063/1.3575562
Tsang, K. H., Kui, H. W., Chik, K. P. (1993) Calorimetric studies of the heat capacity and relaxation of amorphous Si prepared by electron beam evaporation. Journal of Applied Physics, 74 (8). 4932-4935 doi:10.1063/1.354329
Bai, H L, Guo, Q H, He, Z J, Mi, W B, Wu, P, Li, Z Q, Jiang, E Y (2003) Interdiffusion in low-temperature annealed amorphous CoMoN/CN compound soft-x-ray optical multilayer mirrors. Journal of Physics: Condensed Matter, 15 (8). 1235-1246 doi:10.1088/0953-8984/15/8/308
Dang, Y. X., Fan, W. J., Lu, F., Wang, H., Zhang, D. H., Yoon, S. F. (2006) Study of the interdiffusion effect on the band structures of Si1−xGex∕Si quantum wells. Journal of Applied Physics, 99 (7). 76108pp. doi:10.1063/1.2186983
Meyerheim, H. L., Lengeler, B., Göbel, H. E. (1990) Interdiffusion and short‐range order in amorphous Ta‐Si multilayer structures. Journal of Applied Physics, 68 (6). 2694-2701 doi:10.1063/1.346469
Bai, H. Y., Chen, H., Zhang, Y., Wang, W. K. (1993) Interdiffusion of FeTi Multilayers Studied by In-Situ X-Ray Diffraction. physica status solidi (a), 137 (1). 125-133 doi:10.1002/pssa.2211370109
 
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