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Yao, X. Z., Jiang, D. Y. (1997) Effect of secondary electron emission on sheath potential in an electron cyclotron resonance plasma. Journal of Applied Physics, 81 (5). 2119-2123 doi:10.1063/1.364264

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Reference TypeJournal (article/letter/editorial)
TitleEffect of secondary electron emission on sheath potential in an electron cyclotron resonance plasma
JournalJournal of Applied Physics
AuthorsYao, X. Z.Author
Jiang, D. Y.Author
Year1997 (March)Volume81
Issue5
PublisherAIP Publishing
DOIdoi:10.1063/1.364264Search in ResearchGate
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Mindat Ref. ID5084764Long-form Identifiermindat:1:5:5084764:0
GUID0
Full ReferenceYao, X. Z., Jiang, D. Y. (1997) Effect of secondary electron emission on sheath potential in an electron cyclotron resonance plasma. Journal of Applied Physics, 81 (5). 2119-2123 doi:10.1063/1.364264
Plain TextYao, X. Z., Jiang, D. Y. (1997) Effect of secondary electron emission on sheath potential in an electron cyclotron resonance plasma. Journal of Applied Physics, 81 (5). 2119-2123 doi:10.1063/1.364264
In(1997, March) Journal of Applied Physics Vol. 81 (5) AIP Publishing

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Yao, X. Z., Jiang, D. Y. (1997) Observations of Quasiperiodic Transition to Frequency Locking in Electron Cyclotron Resonance Plasma. Physical Review Letters, 79 (25). 5014-5017 doi:10.1103/physrevlett.79.5014
Liu, Minghai, Hu, Xiwei, Wu, Hanming (1997) Study on the ions’ behavior in an electron cyclotron resonance plasma. Journal of Applied Physics, 81 (12). 7734-7738 doi:10.1063/1.365382
Abate, J., Mandel, L. (1973) Intrinsic nonlinearity of secondary electron emission. Journal of Applied Physics, 44 (5). 2122-2123 doi:10.1063/1.1662522
Zhong, X. X., Wu, J. D., Sun, J., Wu, C. Z., Li, F. M. (1999) Numerical study of argon ions transported across the sheath in electron cyclotron resonance discharges. Journal of Applied Physics, 85 (3). 1351-1357 doi:10.1063/1.369266
Cronrath, W., Bowden, M. D., Uchino, K., Muraoka, K., Muta, H., Yoshida, M. (1997) Spatial distributions of electron temperature and density in electron cyclotron resonance discharges. Journal of Applied Physics, 81 (5). 2105-2113 doi:10.1063/1.364262
Cismaru, C., Shohet, J. L. (1999) Plasma vacuum ultraviolet emission in an electron cyclotron resonance etcher. Applied Physics Letters, 74 (18). 2599-2601 doi:10.1063/1.123909
Langendorf, Samuel, Walker, Mitchell (2016) Hysteresis and mode transitions in plasma sheath collapse due to secondary electron emission. Journal of Applied Physics, 119 (11). 113305pp. doi:10.1063/1.4943778
Pool, F. S. (1997) Nitrogen plasma instabilities and the growth of silicon nitride by electron cyclotron resonance microwave plasma chemical vapor deposition. Journal of Applied Physics, 81 (6). 2839-2846 doi:10.1063/1.363943
Schächter, L., Dobrescu, S., Badescu-Singureanu, Al. I., Baltateanu, N. (1998) High secondary electron emission for an enhanced electron density in election cyclotron resonance plasma. Review of Scientific Instruments, 69 (2). 706-708 doi:10.1063/1.1148557
Fan, Z. Y., Newman, N. (1998) Precise control of atomic nitrogen production in an electron cyclotron resonance plasma using N2/noble gas mixtures. Applied Physics Letters, 73 (4). 456-458 doi:10.1063/1.121898
Iizuka, Satoru, Sato, Noriyoshi (1991) Plasma structures in an electron cyclotron resonance plasma processing device. Journal of Applied Physics, 70 (8). 4165-4171 doi:10.1063/1.349139
 
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