Reference Type | Journal (article/letter/editorial) |
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Title | UV Moderation of Nitride Films during Remote Plasma Enhanced Chemical Vapour Deposition |
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Journal | physica status solidi (a) |
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Authors | Butcher, K.S.A. | Author |
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Afifuddin, | Author |
Chen, P.P.-T. | Author |
Goldys, E.M. | Author |
Tansley, T.L. | Author |
Year | 2001 (December) | Volume | 188 |
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Issue | 2 |
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Publisher | Wiley |
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DOI | doi:10.1002/1521-396x(200112)188:2<667::aid-pssa667>3.0.co;2-sSearch in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 5087010 | Long-form Identifier | mindat:1:5:5087010:7 |
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GUID | 0 |
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Full Reference | Butcher, K.S.A., Afifuddin, , Chen, P.P.-T., Goldys, E.M., Tansley, T.L. (2001) UV Moderation of Nitride Films during Remote Plasma Enhanced Chemical Vapour Deposition. physica status solidi (a), 188 (2). 667-671 doi:10.1002/1521-396x(200112)188:2<667::aid-pssa667>3.0.co;2-s |
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Plain Text | Butcher, K.S.A., Afifuddin, , Chen, P.P.-T., Goldys, E.M., Tansley, T.L. (2001) UV Moderation of Nitride Films during Remote Plasma Enhanced Chemical Vapour Deposition. physica status solidi (a), 188 (2). 667-671 doi:10.1002/1521-396x(200112)188:23.0.co;2-s |
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In | (2001, December) physica status solidi (a) Vol. 188 (2) Wiley |
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