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Miyata, Koji, Arai, Hiroyoshi, Hori, Masaru, Goto, Toshio (1997) Absolute density measurement of cyanogen fluoride in CHF3/N2 electron cyclotron resonance plasma using infrared diode laser absorption spectroscopy. Journal of Applied Physics, 82 (10). 4777-4780 doi:10.1063/1.366335

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Reference TypeJournal (article/letter/editorial)
TitleAbsolute density measurement of cyanogen fluoride in CHF3/N2 electron cyclotron resonance plasma using infrared diode laser absorption spectroscopy
JournalJournal of Applied Physics
AuthorsMiyata, KojiAuthor
Arai, HiroyoshiAuthor
Hori, MasaruAuthor
Goto, ToshioAuthor
Year1997 (November 15)Volume82
Issue10
PublisherAIP Publishing
DOIdoi:10.1063/1.366335Search in ResearchGate
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Mindat Ref. ID5087274Long-form Identifiermindat:1:5:5087274:3
GUID0
Full ReferenceMiyata, Koji, Arai, Hiroyoshi, Hori, Masaru, Goto, Toshio (1997) Absolute density measurement of cyanogen fluoride in CHF3/N2 electron cyclotron resonance plasma using infrared diode laser absorption spectroscopy. Journal of Applied Physics, 82 (10). 4777-4780 doi:10.1063/1.366335
Plain TextMiyata, Koji, Arai, Hiroyoshi, Hori, Masaru, Goto, Toshio (1997) Absolute density measurement of cyanogen fluoride in CHF3/N2 electron cyclotron resonance plasma using infrared diode laser absorption spectroscopy. Journal of Applied Physics, 82 (10). 4777-4780 doi:10.1063/1.366335
In(1997, November) Journal of Applied Physics Vol. 82 (10) AIP Publishing

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Tada, Shigekazu, Takashima, Seigou, Ito, Masafumi, Hori, Masaru, Goto, Toshio, Sakamoto, Yuichi (2000) Measurement and control of absolute nitrogen atom density in an electron-beam-excited plasma using vacuum ultraviolet absorption spectroscopy. Journal of Applied Physics, 88 (4). 1756-1759 doi:10.1063/1.1305559
Miyata, Koji, Takahashi, Kunimasa, Kishimoto, Shigeru, Hori, Masaru, Goto, Toshio (1995) $\bf CF_{\ninmbi X}$ ( X=1-3) Radical Measurements in ECR Etching Plasma Employing $\bf C_{4}F_{8}$ Gas by Infrared Diode Laser Absorption Spectroscopy. Japanese Journal of Applied Physics, 34. doi:10.1143/jjap.34.l444
Nakamura, Masayuki, Nakayama, Hirotaka, Ito, Masafumi, Hori, Masaru, Goto, Toshio, Kono, Akihiro, Ishii, Nobuo (1999) Spatial Distribution Measurement of Absolute Densities of CF and CF 2 Radicals in a High Density Plasma Reactor Using a Combination of Single-Path Infrared Diode Laser Absorption Spectroscopy and Laser-Induced Fluorescence Technique. Japanese Journal of Applied Physics, 38. doi:10.1143/jjap.38.l1469
Nakamura, Masayuki, Hori, Masaru, Goto, Toshio, Ito, Masafumi, Ishii, Nobuo (2001) Measurement of Spatial Distribution of SiF4and SiF2Densities in High Density SiF4Plasma Using Single-Path Infrared Diode Laser Absorption Spectroscopy and Laser-Induced Fluorescence Technique. Japanese Journal of Applied Physics, 40. 4730-4735 doi:10.1143/jjap.40.4730
Nozawa, Ryoichi, Takeda, Hirohisa, Ito, Masafumi, Hori, Masaru, Goto, Toshio (1997) Substrate bias effects on low temperature polycrystalline silicon formation using electron cyclotron resonance SiH4/H2 plasma. Journal of Applied Physics, 81 (12). 8035-8039 doi:10.1063/1.365408
Itabashi, Naoshi, Kato, Kozo, Nishiwaki, Nobuki, Goto, Toshio, Yamada, Chikashi, Hirota, Eizi (1988) Measurement of the SiH3Radical Density in Silane Plasma using Infrared Diode Laser Absorption Spectroscopy. Japanese Journal of Applied Physics, 27. doi:10.1143/jjap.27.l1565
Maruyama, Koji, Ohkouchi, Katsunori, Ohtsu, Yasunori, Goto, Toshio (1994) CF3,CF2and CF Radical Measurements in RFCHF3Etching Plasma Using Infrared Diode Laser Absorption Spectroscopy. Japanese Journal of Applied Physics, 33. 4298-4302 doi:10.1143/jjap.33.4298
Takahashi, Kunimasa, Hori, Masaru, Maruyama, Koji, Kishimoto, Shigeru, Goto, Toshio (1993) Measurements of the CF, CF2and CF3Radicals in a CHF3Electron Cyclotron Resonance Plasma. Japanese Journal of Applied Physics, 32. doi:10.1143/jjap.32.l694
Takahashi, Kunimasa, Hori, Masaru, Goto, Toshio (1993) Control of Fluorocarbon Radicals by On-Off Modulated Electron Cyclotron Resonance Plasma. Japanese Journal of Applied Physics, 32. doi:10.1143/jjap.32.l1088
Nozawa, Ryoichi, Takeda, Hirohisa, Ito, Masafumi, Hori, Masaru, Goto, Toshio (1999) In situ observation of hydrogenated amorphous silicon surfaces in electron cyclotron resonance hydrogen plasma annealing. Journal of Applied Physics, 85 (2). 1172-1177 doi:10.1063/1.369242
 
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