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Mühl, T., Brückl, H., Weise, G., Reiss, G. (1997) Nanometer-scale lithography in thin carbon layers using electric field assisted scanning force microscopy. Journal of Applied Physics, 82 (10). 5255-5258 doi:10.1063/1.366392

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Reference TypeJournal (article/letter/editorial)
TitleNanometer-scale lithography in thin carbon layers using electric field assisted scanning force microscopy
JournalJournal of Applied Physics
AuthorsMühl, T.Author
Brückl, H.Author
Weise, G.Author
Reiss, G.Author
Year1997 (November 15)Volume82
Issue10
PublisherAIP Publishing
DOIdoi:10.1063/1.366392Search in ResearchGate
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Mindat Ref. ID5087388Long-form Identifiermindat:1:5:5087388:5
GUID0
Full ReferenceMühl, T., Brückl, H., Weise, G., Reiss, G. (1997) Nanometer-scale lithography in thin carbon layers using electric field assisted scanning force microscopy. Journal of Applied Physics, 82 (10). 5255-5258 doi:10.1063/1.366392
Plain TextMühl, T., Brückl, H., Weise, G., Reiss, G. (1997) Nanometer-scale lithography in thin carbon layers using electric field assisted scanning force microscopy. Journal of Applied Physics, 82 (10). 5255-5258 doi:10.1063/1.366392
In(1997, November) Journal of Applied Physics Vol. 82 (10) AIP Publishing

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Luciński, T., Kopcewicz, M., Hütten, A., Brückl, H., Heitmann, S., Hempel, T., Reiss, G. (2003) Magnetic and Mössbauer study of Fe/Si multilayers. Journal of Applied Physics, 93 (10). 6501-6503 doi:10.1063/1.1558656
Reiss, G., Hastreiter, E., Brückl, H., Vancea, J. (1991) Thickness-dependent thin-film resistivity: Application of quantitative scanning-tunneling-microscopy imaging. Physical Review B, 43 (6) 5176-5179 doi:10.1103/physrevb.43.5176
Missert, N., Friedmann, T. A., Sullivan, J. P., Copeland, R. G. (1997) Characterization of electron emission from planar amorphous carbon thin films using in situ scanning electron microscopy. Applied Physics Letters, 70 (15). 1995-1997 doi:10.1063/1.119078
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