Falkenstein, Zoran, Coogan, John J. (1997) Photoresist etching with dielectric barrier discharges in oxygen. Journal of Applied Physics, 82 (12). 6273-6280 doi:10.1063/1.366514
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Photoresist etching with dielectric barrier discharges in oxygen | ||
| Journal | Journal of Applied Physics | ||
| Authors | Falkenstein, Zoran | Author | |
| Coogan, John J. | Author | ||
| Year | 1997 (December 15) | Volume | 82 |
| Issue | 12 | ||
| Publisher | AIP Publishing | ||
| DOI | doi:10.1063/1.366514Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 5087705 | Long-form Identifier | mindat:1:5:5087705:8 |
| GUID | 0 | ||
| Full Reference | Falkenstein, Zoran, Coogan, John J. (1997) Photoresist etching with dielectric barrier discharges in oxygen. Journal of Applied Physics, 82 (12). 6273-6280 doi:10.1063/1.366514 | ||
| Plain Text | Falkenstein, Zoran, Coogan, John J. (1997) Photoresist etching with dielectric barrier discharges in oxygen. Journal of Applied Physics, 82 (12). 6273-6280 doi:10.1063/1.366514 | ||
| In | (1997, December) Journal of Applied Physics Vol. 82 (12) AIP Publishing | ||
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