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Pan, S. S., Ye, C., Teng, X. M., Fan, H. T., Li, G. H. (2007) Controllable growth of α- and β-FeSi2thin films on Si(100) by facing-target sputtering. physica status solidi (a), 204 (10). 3316-3320 doi:10.1002/pssa.200622438

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Reference TypeJournal (article/letter/editorial)
TitleControllable growth of α- and β-FeSi2thin films on Si(100) by facing-target sputtering
Journalphysica status solidi (a)
AuthorsPan, S. S.Author
Ye, C.Author
Teng, X. M.Author
Fan, H. T.Author
Li, G. H.Author
Year2007 (October)Volume204
Issue10
PublisherWiley
DOIdoi:10.1002/pssa.200622438Search in ResearchGate
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Mindat Ref. ID5093107Long-form Identifiermindat:1:5:5093107:3
GUID0
Full ReferencePan, S. S., Ye, C., Teng, X. M., Fan, H. T., Li, G. H. (2007) Controllable growth of α- and β-FeSi2thin films on Si(100) by facing-target sputtering. physica status solidi (a), 204 (10). 3316-3320 doi:10.1002/pssa.200622438
Plain TextPan, S. S., Ye, C., Teng, X. M., Fan, H. T., Li, G. H. (2007) Controllable growth of α- and β-FeSi2thin films on Si(100) by facing-target sputtering. physica status solidi (a), 204 (10). 3316-3320 doi:10.1002/pssa.200622438
In(2007, October) physica status solidi (a) Vol. 204 (10) Wiley

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