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Carstensen, J., Foca, E., Keipert, S., Föll, H., Leisner, M., Cojocaru, A. (2008) New modes of FFT impedance spectroscopy applied to semiconductor pore etching and materials characterization. physica status solidi (a), 205 (11). 2485-2503 doi:10.1002/pssa.200824033

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Reference TypeJournal (article/letter/editorial)
TitleNew modes of FFT impedance spectroscopy applied to semiconductor pore etching and materials characterization
Journalphysica status solidi (a)
AuthorsCarstensen, J.Author
Foca, E.Author
Keipert, S.Author
Föll, H.Author
Leisner, M.Author
Cojocaru, A.Author
Year2008 (November)Volume205
Issue11
PublisherWiley
DOIdoi:10.1002/pssa.200824033Search in ResearchGate
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Mindat Ref. ID5094557Long-form Identifiermindat:1:5:5094557:1
GUID0
Full ReferenceCarstensen, J., Foca, E., Keipert, S., Föll, H., Leisner, M., Cojocaru, A. (2008) New modes of FFT impedance spectroscopy applied to semiconductor pore etching and materials characterization. physica status solidi (a), 205 (11). 2485-2503 doi:10.1002/pssa.200824033
Plain TextCarstensen, J., Foca, E., Keipert, S., Föll, H., Leisner, M., Cojocaru, A. (2008) New modes of FFT impedance spectroscopy applied to semiconductor pore etching and materials characterization. physica status solidi (a), 205 (11). 2485-2503 doi:10.1002/pssa.200824033
In(2008, November) physica status solidi (a) Vol. 205 (11) Wiley

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Carstensen, Jürgen, Föll, Helmut, Cojocaru, Ala, Leisner, Malte (2009) In-situ FFT impedance spectroscopy in new modes applied to pore growth in semiconductors. physica status solidi (c), 6 (7). 1629-1633 doi:10.1002/pssc.200881029
Foca, E., Carstensen, J., Popkirov, G., Föll, H. (2007) Pores growth control by in-situ FFT impedance spectroscopy. physica status solidi (a), 204 (5). 1378-1382 doi:10.1002/pssa.200674350
Leisner, Malte, Carstensen, Jürgen, Cojocaru, Ala, Föll, Helmut (2009) Pore growth on n-type InP investigated by in-situ FFT impedance spectroscopy. physica status solidi (c), 6 (7). 1566-1570 doi:10.1002/pssc.200881014
Frey, S., Kemell, M., Carstensen, J., Langa, S., Föll, H. (2005) Fast pore etching. physica status solidi (a), 202 (8). 1369-1373 doi:10.1002/pssa.200461104
Langa, S., Christophersen, M., Carstensen, J., Tiginyanu, I. M., Föll, H. (2003) Electrochemical pore etching in Ge. physica status solidi (a), 195 (3). doi:10.1002/pssa.200306456
Fang, C., Föll, H., Carstensen, J., Langa, S. (2007) Electrochemical pore etching in Ge - An overview. physica status solidi (a), 204 (5). 1292-1296 doi:10.1002/pssa.200674312
Foca, E., Carstensen, J., Föll, H. (2005) Monte Carlo simulation of electrochemical oscillations in the electropolishing regime. physica status solidi (a), 202 (8). 1524-1528 doi:10.1002/pssa.200461169
Frey, S., Keipert, S., Chazalviel, J.-N., Ozanam, F., Carstensen, J., Föll, H. (2007) Electrochemical formation of porous silica: toward an understanding of the mechanisms. physica status solidi (a), 204 (5). 1250-1254 doi:10.1002/pssa.200674302
Cojocaru, Ala, Leisner, Malte, Carstensen, Jürgen, Föll, Helmut (2011) Comparison of currentline pore growth in n-type InP and in n-type Si. physica status solidi (c), 8 (6). 1779-1782 doi:10.1002/pssc.201000034
Föll, H., Leisner, M., Cojocaru, A., Carstensen, J. (2009) Self-organization phenomena at semiconductor electrodes. Electrochimica Acta, 55 (2). 327-339 doi:10.1016/j.electacta.2009.03.076
Christophersen, M., Carstensen, J., Voigt, K., Föll, H. (2003) Organic and aqueous electrolytes used for etching macro- and mesoporous silicon. physica status solidi (a), 197 (1). 34-38 doi:10.1002/pssa.200306464
 
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