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Pinnow, C. U., Bicker, M., Geyer, U., Schneider, S., Goerigk, G. (2001) Decomposition and nanocrystallization in reactively sputtered amorphous Ta–Si–N thin films. Journal of Applied Physics, 90 (4). 1986-1991 doi:10.1063/1.1388173

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Reference TypeJournal (article/letter/editorial)
TitleDecomposition and nanocrystallization in reactively sputtered amorphous Ta–Si–N thin films
JournalJournal of Applied Physics
AuthorsPinnow, C. U.Author
Bicker, M.Author
Geyer, U.Author
Schneider, S.Author
Goerigk, G.Author
Year2001 (August 15)Volume90
Issue4
PublisherAIP Publishing
DOIdoi:10.1063/1.1388173Search in ResearchGate
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Mindat Ref. ID5110122Long-form Identifiermindat:1:5:5110122:6
GUID0
Full ReferencePinnow, C. U., Bicker, M., Geyer, U., Schneider, S., Goerigk, G. (2001) Decomposition and nanocrystallization in reactively sputtered amorphous Ta–Si–N thin films. Journal of Applied Physics, 90 (4). 1986-1991 doi:10.1063/1.1388173
Plain TextPinnow, C. U., Bicker, M., Geyer, U., Schneider, S., Goerigk, G. (2001) Decomposition and nanocrystallization in reactively sputtered amorphous Ta–Si–N thin films. Journal of Applied Physics, 90 (4). 1986-1991 doi:10.1063/1.1388173
In(2001, August) Journal of Applied Physics Vol. 90 (4) AIP Publishing

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Bicker, M., Pinnow, C.-U., Geyer, U., Schneider, S., Seibt, M. (2001) Nanocrystallization of amorphous-Ta40Si14N46 diffusion barrier thin films. Applied Physics Letters, 78 (23). 3618-3620 doi:10.1063/1.1377626
Laudahn, U., Fähler, S., Krebs, H. U., Pundt, A., Bicker, M., v. Hülsen, U., Geyer, U., Kirchheim, R. (1999) Determination of elastic constants in thin films using hydrogen loading. Applied Physics Letters, 74 (5). 647-649 doi:10.1063/1.123028
Music, Denis, Bliem, Pascal, Geyer, Richard W., Schneider, Jochen M. (2015) Atomistic growth phenomena of reactively sputtered RuO2 and MnO2 thin films. Journal of Applied Physics, 118 (1). 15302pp. doi:10.1063/1.4926414
Pinnow, C. U., Kasko, I., Nagel, N., Mikolajick, T., Dehm, C., Jahnel, F., Seibt, M., Geyer, U., Samwer, K. (2002) Oxygen tracer diffusion in IrO2 barrier films. Journal of Applied Physics, 91 (3). 1707-1709 doi:10.1063/1.1425069
Bicker, M., von Hülsen, U., Laudahn, U., Pundt, A., Geyer, U. (1998) Optical deflection setup for stress measurements in thin films. Review of Scientific Instruments, 69 (2). 460-462 doi:10.1063/1.1148721
Zhao, Z. B., Rek, Z. U., Yalisove, S. M., Bilello, J. C. (2005) Evolution of in-plane texture in reactively sputtered CrN films. Journal of Applied Physics, 97 (2). 23525pp. doi:10.1063/1.1823022
Gasser, S. M., Kolawa, E., Nicolet, M.-A. (1999) Reactively sputtered Ru–Si–O films. Journal of Applied Physics, 86 (4). 1974-1981 doi:10.1063/1.370996
Geyer, U., von Hülsen, U., Thiyagarajan, P. (1997) Surface roughening and columnar growth of thin amorphous CuTi films. Applied Physics Letters, 70 (13). 1691-1693 doi:10.1063/1.118671
Geyer, U., von Hülsen, U., Kopf, H. (1998) Internal interfaces and intrinsic stress in thin amorphous Cu-Ti and Co-Tb films. Journal of Applied Physics, 83 (6). 3065-3070 doi:10.1063/1.367061
Johansson, B. O., Helmersson, U., Hibbs, M. K., Sundgren, J.‐E. (1985) Reactively magnetron sputtered Hf‐N films. I. Composition and structure. Journal of Applied Physics, 58 (8). 3104-3111 doi:10.1063/1.335812
Johansson, B. O., Sundgren, J.‐E., Helmersson, U., Hibbs, M. K. (1984) Structure of reactively magnetron sputtered Hf‐N films. Applied Physics Letters, 44 (7). 670-672 doi:10.1063/1.94871
 
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