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Chiu, K.-F., Barber, Z. H. (2002) Characterization of inductively coupled plasma in the ionized physical vapor deposition system. Journal of Applied Physics, 91 (4). 1797-1803 doi:10.1063/1.1430897

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Reference TypeJournal (article/letter/editorial)
TitleCharacterization of inductively coupled plasma in the ionized physical vapor deposition system
JournalJournal of Applied Physics
AuthorsChiu, K.-F.Author
Barber, Z. H.Author
Year2002 (February 15)Volume91
Issue4
PublisherAIP Publishing
DOIdoi:10.1063/1.1430897Search in ResearchGate
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Mindat Ref. ID5113653Long-form Identifiermindat:1:5:5113653:2
GUID0
Full ReferenceChiu, K.-F., Barber, Z. H. (2002) Characterization of inductively coupled plasma in the ionized physical vapor deposition system. Journal of Applied Physics, 91 (4). 1797-1803 doi:10.1063/1.1430897
Plain TextChiu, K.-F., Barber, Z. H. (2002) Characterization of inductively coupled plasma in the ionized physical vapor deposition system. Journal of Applied Physics, 91 (4). 1797-1803 doi:10.1063/1.1430897
In(2002, February) Journal of Applied Physics Vol. 91 (4) AIP Publishing

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