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Sankaran, Arvind, Kushner, Mark J. (2002) Harmonic content of electron-impact source functions in inductively coupled plasmas using an “on-the-fly” Monte Carlo technique. Journal of Applied Physics, 92 (2). 736-748 doi:10.1063/1.1487455

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Reference TypeJournal (article/letter/editorial)
TitleHarmonic content of electron-impact source functions in inductively coupled plasmas using an “on-the-fly” Monte Carlo technique
JournalJournal of Applied Physics
AuthorsSankaran, ArvindAuthor
Kushner, Mark J.Author
Year2002 (July 15)Volume92
Issue2
PublisherAIP Publishing
DOIdoi:10.1063/1.1487455Search in ResearchGate
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Mindat Ref. ID5115968Long-form Identifiermindat:1:5:5115968:5
GUID0
Full ReferenceSankaran, Arvind, Kushner, Mark J. (2002) Harmonic content of electron-impact source functions in inductively coupled plasmas using an “on-the-fly” Monte Carlo technique. Journal of Applied Physics, 92 (2). 736-748 doi:10.1063/1.1487455
Plain TextSankaran, Arvind, Kushner, Mark J. (2002) Harmonic content of electron-impact source functions in inductively coupled plasmas using an “on-the-fly” Monte Carlo technique. Journal of Applied Physics, 92 (2). 736-748 doi:10.1063/1.1487455
In(2002, July) Journal of Applied Physics Vol. 92 (2) AIP Publishing

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Logue, Michael D., Kushner, Mark J. (2015) Electron energy distributions and electron impact source functions in Ar/N2 inductively coupled plasmas using pulsed power. Journal of Applied Physics, 117 (4). 43301pp. doi:10.1063/1.4904935
Vasenkov, Alex V., Kushner, Mark J. (2003) Angular anisotropy of electron energy distributions in inductively coupled plasmas. Journal of Applied Physics, 94 (9). 5522-5529 doi:10.1063/1.1614428
Vasenkov, Alex V., Kushner, Mark J. (2003) Harmonic content and time variation of electron energy distributions in high-plasma-density, low-pressure inductively coupled discharges. Journal of Applied Physics, 94 (4). 2223-2233 doi:10.1063/1.1592630
Sankaran, Arvind, Kushner, Mark J. (2005) Etching of porous and solid SiO2 in Ar∕c-C4F8, O2∕c-C4F8 and Ar∕O2∕c-C4F8 plasmas. Journal of Applied Physics, 97 (2). 23307pp. doi:10.1063/1.1834979
Subramonium, Pramod, Kushner, Mark J. (2001) Pulsed inductively coupled chlorine plasmas in the presence of a substrate bias. Applied Physics Letters, 79 (14). 2145-2147 doi:10.1063/1.1406139
Collison, Wenli Z., Kushner, Mark J. (1996) Ion drag effects in inductively coupled plasmas for etching. Applied Physics Letters, 68 (7). 903-905 doi:10.1063/1.116225
Wang, Mingmei, Kushner, Mark J. (2010) High energy electron fluxes in dc-augmented capacitively coupled plasmas I. Fundamental characteristics. Journal of Applied Physics, 107 (2). 23308pp. doi:10.1063/1.3290870
Kushner, M. J. (1983) Monte‐Carlo simulation of electron properties in rf parallel plate capacitively coupled discharges. Journal of Applied Physics, 54 (9). 4958-4965 doi:10.1063/1.332763
Qu, Chenhui, Lanham, Steven J., Shannon, Steven C., Nam, Sang Ki, Kushner, Mark J. (2020) Power matching to pulsed inductively coupled plasmas. Journal of Applied Physics, 127 (13) 133302pp. doi:10.1063/5.0002522
Shimada, Masashi, Tynan, George R., Cattolica, Robert (2008) Neutral depletion in inductively coupled plasmas using hybrid-type direct simulation Monte Carlo. Journal of Applied Physics, 103 (3). 33304pp. doi:10.1063/1.2836938
Wang, Mingmei, Kushner, Mark J. (2010) High energy electron fluxes in dc-augmented capacitively coupled plasmas. II. Effects on twisting in high aspect ratio etching of dielectrics. Journal of Applied Physics, 107 (2). 23309pp. doi:10.1063/1.3290873
 
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