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Morrison, N. A., William, C., Milne, W. I. (2003) Methane chemistry involved in a low-pressure electron cyclotron wave resonant plasma discharge. Journal of Applied Physics, 94 (11). 7031-7043 doi:10.1063/1.1621711

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Reference TypeJournal (article/letter/editorial)
TitleMethane chemistry involved in a low-pressure electron cyclotron wave resonant plasma discharge
JournalJournal of Applied Physics
AuthorsMorrison, N. A.Author
William, C.Author
Milne, W. I.Author
Year2003 (December)Volume94
Issue11
PublisherAIP Publishing
DOIdoi:10.1063/1.1621711Search in ResearchGate
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Mindat Ref. ID5121921Long-form Identifiermindat:1:5:5121921:5
GUID0
Full ReferenceMorrison, N. A., William, C., Milne, W. I. (2003) Methane chemistry involved in a low-pressure electron cyclotron wave resonant plasma discharge. Journal of Applied Physics, 94 (11). 7031-7043 doi:10.1063/1.1621711
Plain TextMorrison, N. A., William, C., Milne, W. I. (2003) Methane chemistry involved in a low-pressure electron cyclotron wave resonant plasma discharge. Journal of Applied Physics, 94 (11). 7031-7043 doi:10.1063/1.1621711
In(2003, December) Journal of Applied Physics Vol. 94 (11) AIP Publishing

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Izmajlowicz, M. A. T., Flewitt, A. J., Milne, W. I., Morrison, N. A. (2003) Directional nickel-induced fielded aided lateral crystallization of amorphous silicon. Journal of Applied Physics, 94 (12). 7535pp. doi:10.1063/1.1627455
Stern, R. A. (1964) INTERACTION OF RESONANT PLASMA OSCILLATIONS IN A LOW‐PRESSURE Hg DISCHARGE. Applied Physics Letters, 4 (4). 80-82 doi:10.1063/1.1753972
Racine, B., Ferrari, A. C., Morrison, N. A., Hutchings, I., Milne, W. I., Robertson, J. (2001) Properties of amorphous carbon–silicon alloys deposited by a high plasma density source. Journal of Applied Physics, 90 (10). 5002-5012 doi:10.1063/1.1406966
Iizuka, S., Koizumi, T., Takada, T., Sato, N. (1993) Effect of electron temperature on negative hydrogen ion production in a low‐pressure Ar discharge plasma with methane. Applied Physics Letters, 63 (12). 1619-1621 doi:10.1063/1.110714
Bickel, William S. (1966) Acoustical Plasma Wave in a Hollow Cathode Discharge. Journal of Applied Physics, 37 (11). 4300-4301 doi:10.1063/1.1708028
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Morrison, N. A., Muhl, S., Rodil, S. E., Ferrari, A. C., Nesládek, M., Milne, W. I., Robertson, J. (1999) The Preparation, Characterization and Tribological Properties of TA-C:H Deposited Using an Electron Cyclotron Wave Resonance Plasma Beam Source. physica status solidi (a), 172 (1). 79-90 doi:10.1002/(sici)1521-396x(199903)172:1<79::aid-pssa79>3.0.co;2-c
Krimke, Ralf, Urbassek, Herbert M. (1997) Self-consistent simulation of a planar electron-cyclotron-wave-resonance discharge. Journal of Applied Physics, 81 (11). 7163-7169 doi:10.1063/1.365314
Iizuka, S., Sato, N. (1995) Response to ‘‘Comment on ‘Effect of electron temperature on negative‐hydrogen ion production in a low‐pressure Ar discharge plasma with methane’ ’’ [Appl. Phys. Lett. 67, 1034 (1995)]. Applied Physics Letters, 67 (7). 1035 doi:10.1063/1.114722
Pinnaduwage, Lal A. (1995) Comment on ‘‘Effect of electron temperature on negative hydrogen ion production in a low‐pressure Ar discharge plasma with methane’’ [Appl. Phys. Lett. 63, 1619 (1993)]. Applied Physics Letters, 67 (7). 1034 doi:10.1063/1.114721
Laviale, D., Oberlin, J. C., Devine, R. A. B. (1994) Low pressure microwave electron cyclotron resonance plasma deposition of amorphous Ta2O5films. Applied Physics Letters, 65 (16). 2021-2023 doi:10.1063/1.112781
 
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