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Toh, Eng-Huat, Wang, Grace Huiqi, Samudra, Ganesh, Yeo, Yee-Chia (2008) Device physics and design of germanium tunneling field-effect transistor with source and drain engineering for low power and high performance applications. Journal of Applied Physics, 103 (10). 104504pp. doi:10.1063/1.2924413

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Reference TypeJournal (article/letter/editorial)
TitleDevice physics and design of germanium tunneling field-effect transistor with source and drain engineering for low power and high performance applications
JournalJournal of Applied Physics
AuthorsToh, Eng-HuatAuthor
Wang, Grace HuiqiAuthor
Samudra, GaneshAuthor
Yeo, Yee-ChiaAuthor
Year2008 (May 15)Volume103
Issue10
PublisherAIP Publishing
DOIdoi:10.1063/1.2924413Search in ResearchGate
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Mindat Ref. ID5152883Long-form Identifiermindat:1:5:5152883:0
GUID0
Full ReferenceToh, Eng-Huat, Wang, Grace Huiqi, Samudra, Ganesh, Yeo, Yee-Chia (2008) Device physics and design of germanium tunneling field-effect transistor with source and drain engineering for low power and high performance applications. Journal of Applied Physics, 103 (10). 104504pp. doi:10.1063/1.2924413
Plain TextToh, Eng-Huat, Wang, Grace Huiqi, Samudra, Ganesh, Yeo, Yee-Chia (2008) Device physics and design of germanium tunneling field-effect transistor with source and drain engineering for low power and high performance applications. Journal of Applied Physics, 103 (10). 104504pp. doi:10.1063/1.2924413
In(2008, May) Journal of Applied Physics Vol. 103 (10) AIP Publishing


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