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Ehiasarian, A. P., Vetushka, A., Gonzalvo, Y. Aranda, Sáfrán, G., Székely, L., Barna, P. B. (2011) Influence of high power impulse magnetron sputtering plasma ionization on the microstructure of TiN thin films. Journal of Applied Physics, 109 (10). 104314pp. doi:10.1063/1.3579443

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Reference TypeJournal (article/letter/editorial)
TitleInfluence of high power impulse magnetron sputtering plasma ionization on the microstructure of TiN thin films
JournalJournal of Applied Physics
AuthorsEhiasarian, A. P.Author
Vetushka, A.Author
Gonzalvo, Y. ArandaAuthor
Sáfrán, G.Author
Székely, L.Author
Barna, P. B.Author
Year2011 (May 15)Volume109
Issue10
PublisherAIP Publishing
DOIdoi:10.1063/1.3579443Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID5178689Long-form Identifiermindat:1:5:5178689:6
GUID0
Full ReferenceEhiasarian, A. P., Vetushka, A., Gonzalvo, Y. Aranda, Sáfrán, G., Székely, L., Barna, P. B. (2011) Influence of high power impulse magnetron sputtering plasma ionization on the microstructure of TiN thin films. Journal of Applied Physics, 109 (10). 104314pp. doi:10.1063/1.3579443
Plain TextEhiasarian, A. P., Vetushka, A., Gonzalvo, Y. Aranda, Sáfrán, G., Székely, L., Barna, P. B. (2011) Influence of high power impulse magnetron sputtering plasma ionization on the microstructure of TiN thin films. Journal of Applied Physics, 109 (10). 104314pp. doi:10.1063/1.3579443
In(2011, May) Journal of Applied Physics Vol. 109 (10) AIP Publishing

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Ehiasarian, A. P., Vetushka, A., Hecimovic, A., Konstantinidis, S. (2008) Ion composition produced by high power impulse magnetron sputtering discharges near the substrate. Journal of Applied Physics, 104 (8). 83305pp. doi:10.1063/1.3000446
Ehiasarian, A. P., Wen, J. G., Petrov, I. (2007) Interface microstructure engineering by high power impulse magnetron sputtering for the enhancement of adhesion. Journal of Applied Physics, 101 (5). 54301pp. doi:10.1063/1.2697052
Hecimovic, A., Ehiasarian, A. P. (2010) Spatial and temporal evolution of ion energies in high power impulse magnetron sputtering plasma discharge. Journal of Applied Physics, 108 (6). 63301pp. doi:10.1063/1.3486018
Andersson, Joakim, Ehiasarian, Arutiun P., Anders, André (2008) Observation of Ti4+ ions in a high power impulse magnetron sputtering plasma. Applied Physics Letters, 93 (7). 71504pp. doi:10.1063/1.2973179
Hecimovic, A, Burcalova, K, Ehiasarian, A P (2008) Origins of ion energy distribution function (IEDF) in high power impulse magnetron sputtering (HIPIMS) plasma discharge. Journal of Physics D: Applied Physics, 41. 95203pp. doi:10.1088/0022-3727/41/9/095203
Ehiasarian, A. P., Hecimovic, A., de los Arcos, T., New, R., Schulz-von der Gathen, V., Böke, M., Winter, J. (2012) High power impulse magnetron sputtering discharges: Instabilities and plasma self-organization. Applied Physics Letters, 100 (11). 114101pp. doi:10.1063/1.3692172
Ehiasarian, Arutiun P, Andersson, Joakim, Anders, André (2010) Distance-dependent plasma composition and ion energy in high power impulse magnetron sputtering. Journal of Physics D: Applied Physics, 43. 275204pp. doi:10.1088/0022-3727/43/27/275204
Ehiasarian, Arutiun P. (2010) High-power impulse magnetron sputtering and its applications. Pure and Applied Chemistry, 82 (6) 1247-1258 doi:10.1351/pac-con-09-10-43
Anders, André, Andersson, Joakim, Ehiasarian, Arutiun (2007) High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering. Journal of Applied Physics, 102 (11). 113303pp. doi:10.1063/1.2817812
Ehiasarian, A P, Sugumaran, A A, Hovsepian, P Eh, Davies, C, Hatto, P (2022) Real-time monitoring of plasma synthesis of functional materials by high power impulse magnetron sputtering and other PVD processes: towards a physics-constrained digital twin. Journal of Physics D: Applied Physics, 56 (3) 35302 doi:10.1088/1361-6463/aca25a
Kozák, Tomáš, Dagmar Pajdarová, Andrea (2011) A non-stationary model for high power impulse magnetron sputtering discharges. Journal of Applied Physics, 110 (10). 103303pp. doi:10.1063/1.3656446
 
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