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Oezer, D., Ramírez, G., Rodil, S. E., Sanjinés, R. (2012) Electrical and optical properties of Ta-Si-N thin films deposited by reactive magnetron sputtering. Journal of Applied Physics, 112 (11). 114302pp. doi:10.1063/1.4766904

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Reference TypeJournal (article/letter/editorial)
TitleElectrical and optical properties of Ta-Si-N thin films deposited by reactive magnetron sputtering
JournalJournal of Applied Physics
AuthorsOezer, D.Author
Ramírez, G.Author
Rodil, S. E.Author
Sanjinés, R.Author
Year2012 (December)Volume112
Issue11
PublisherAIP Publishing
DOIdoi:10.1063/1.4766904Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID5190018Long-form Identifiermindat:1:5:5190018:6
GUID0
Full ReferenceOezer, D., Ramírez, G., Rodil, S. E., Sanjinés, R. (2012) Electrical and optical properties of Ta-Si-N thin films deposited by reactive magnetron sputtering. Journal of Applied Physics, 112 (11). 114302pp. doi:10.1063/1.4766904
Plain TextOezer, D., Ramírez, G., Rodil, S. E., Sanjinés, R. (2012) Electrical and optical properties of Ta-Si-N thin films deposited by reactive magnetron sputtering. Journal of Applied Physics, 112 (11). 114302pp. doi:10.1063/1.4766904
In(2012, December) Journal of Applied Physics Vol. 112 (11) AIP Publishing

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Broitman, E., Hellgren, N., Järrendahl, K., Johansson, M. P., Olafsson, S., Radnóczi, G., Sundgren, J.-E., Hultman, L. (2001) Electrical and optical properties of CNx(0⩽x⩽0.25) films deposited by reactive magnetron sputtering. Journal of Applied Physics, 89 (2). 1184-1190 doi:10.1063/1.1334370
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