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Yamashita, Yoshiyuki, Yoshikawa, Hideki, Chikyow, Toyohiro, Kobayashi, Keisuke (2013) Bias-voltage application in a hard x-ray photoelectron spectroscopic study of the interface states at oxide/Si(100) interfaces. Journal of Applied Physics, 113 (16). 163707pp. doi:10.1063/1.4803491

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Reference TypeJournal (article/letter/editorial)
TitleBias-voltage application in a hard x-ray photoelectron spectroscopic study of the interface states at oxide/Si(100) interfaces
JournalJournal of Applied Physics
AuthorsYamashita, YoshiyukiAuthor
Yoshikawa, HidekiAuthor
Chikyow, ToyohiroAuthor
Kobayashi, KeisukeAuthor
Year2013 (April 28)Volume113
Issue16
PublisherAIP Publishing
DOIdoi:10.1063/1.4803491Search in ResearchGate
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Mindat Ref. ID5192246Long-form Identifiermindat:1:5:5192246:1
GUID0
Full ReferenceYamashita, Yoshiyuki, Yoshikawa, Hideki, Chikyow, Toyohiro, Kobayashi, Keisuke (2013) Bias-voltage application in a hard x-ray photoelectron spectroscopic study of the interface states at oxide/Si(100) interfaces. Journal of Applied Physics, 113 (16). 163707pp. doi:10.1063/1.4803491
Plain TextYamashita, Yoshiyuki, Yoshikawa, Hideki, Chikyow, Toyohiro, Kobayashi, Keisuke (2013) Bias-voltage application in a hard x-ray photoelectron spectroscopic study of the interface states at oxide/Si(100) interfaces. Journal of Applied Physics, 113 (16). 163707pp. doi:10.1063/1.4803491
In(2013, April) Journal of Applied Physics Vol. 113 (16) AIP Publishing

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Yamashita, Yoshiyuki, Yoshikawa, Hideki, Chikyo, Toyohiro (2014) Bias dependent potential distribution of a Pt/HfO2/SiO2/Si gate structure obtained from a bias application in hard X-ray photoelectron spectroscopy. Japanese Journal of Applied Physics, 53 (5) 5 doi:10.7567/jjap.53.05fh05
Nagata, Takahiro, Yamashita, Yoshiyuki, Yoshikawa, Hideki, Uehara, Tsuyoshi, Haemori, Masamitsu, Kobayashi, Keisuke, Chikyow, Toyohiro (2012) Effect of near atmospheric pressure nitrogen plasma treatment on Pt/ZnO interface. Journal of Applied Physics, 112 (11). 116104pp. doi:10.1063/1.4768908
Nagata, Takahiro, Yamashita, Yoshiyuki, Yoshikawa, Hideki, Imura, Masataka, Oh, Seungjun, Kobashi, Kazuyoshi, Chikyow, Toyohiro (2015) Bias induced Cu ion migration behavior in resistive change memory structure observed by hard X-ray photoelectron spectroscopy. Japanese Journal of Applied Physics, 54 (6) 6 doi:10.7567/jjap.54.06fg01
Bierwagen, Oliver, Speck, James S., Nagata, Takahiro, Chikyow, Toyohiro, Yamashita, Yoshiyuki, Yoshikawa, Hideki, Kobayashi, Keisuke (2011) Depletion of the In2O3(001) and (111) surface electron accumulation by an oxygen plasma surface treatment. Applied Physics Letters, 98 (17). 172101pp. doi:10.1063/1.3583446
Nagata, T., Haemori, M., Yamashita, Y., Yoshikawa, H., Iwashita, Y., Kobayashi, K., Chikyow, T. (2011) Bias application hard x-ray photoelectron spectroscopy study of forming process of Cu/HfO2/Pt resistive random access memory structure. Applied Physics Letters, 99 (22). 223517pp. doi:10.1063/1.3664781
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