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Rostem, K., Chuss, D. T., Colazo, F. A., Crowe, E. J., Denis, K. L., Lourie, N. P., Moseley, S. H., Stevenson, T. R., Wollack, E. J. (2014) Precision control of thermal transport in cryogenic single-crystal silicon devices. Journal of Applied Physics, 115 (12). 124508pp. doi:10.1063/1.4869737

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Reference TypeJournal (article/letter/editorial)
TitlePrecision control of thermal transport in cryogenic single-crystal silicon devices
JournalJournal of Applied Physics
AuthorsRostem, K.Author
Chuss, D. T.Author
Colazo, F. A.Author
Crowe, E. J.Author
Denis, K. L.Author
Lourie, N. P.Author
Moseley, S. H.Author
Stevenson, T. R.Author
Wollack, E. J.Author
Year2014 (March 28)Volume115
Issue12
PublisherAIP Publishing
DOIdoi:10.1063/1.4869737Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID5196360Long-form Identifiermindat:1:5:5196360:8
GUID0
Full ReferenceRostem, K., Chuss, D. T., Colazo, F. A., Crowe, E. J., Denis, K. L., Lourie, N. P., Moseley, S. H., Stevenson, T. R., Wollack, E. J. (2014) Precision control of thermal transport in cryogenic single-crystal silicon devices. Journal of Applied Physics, 115 (12). 124508pp. doi:10.1063/1.4869737
Plain TextRostem, K., Chuss, D. T., Colazo, F. A., Crowe, E. J., Denis, K. L., Lourie, N. P., Moseley, S. H., Stevenson, T. R., Wollack, E. J. (2014) Precision control of thermal transport in cryogenic single-crystal silicon devices. Journal of Applied Physics, 115 (12). 124508pp. doi:10.1063/1.4869737
In(2014, March) Journal of Applied Physics Vol. 115 (12) AIP Publishing

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